SCHEMBL658618

SCHEMBL658618

Cc1ccc(S(=O)(=O)O)c(C2CCCCC2C)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS3 P29474 1/20 0.38
NOS1 P29475 1/20 0.38
NOS2 P35228 1/20 0.38
JAK2 O60674 1/20 0.36
JAK1 P23458 1/20 0.36
TYK2 P29597 1/20 0.36
JAK3 P52333 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
TSHR P16473 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
EPHX2 P34913 6/20 0.35
TP53 P04637 1/20 0.35
CASP1 P29466 1/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.35
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
MCOLN3 Q8TDD5 1/20 0.33
LMNA P02545 1/20 0.33
HCRTR1 O43613 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8076430 0.97 NOS3 (0.41) NOS3NOS1NOS2JAK2JAK1
SCHEMBL16712213 0.91 NOS3 (0.45) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL780172 0.87 NOS3 (0.38) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL7100547 0.85 NOS3 (0.38) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL9101004 0.82 EPHX2 (0.37) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL5278348 0.81 PTGDR2 (0.47) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL28994030 0.81 POLB (0.36) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL9099859 0.80 LMNA (0.36) NOS1JAK2JAK1TYK2JAK3
SCHEMBL2217850 0.80 PTGDR2 (0.46) NOS3NOS1NOS2SMN1; SMN2TSHR
SCHEMBL361128 0.80 PTGDR2 (0.49) SMN1; SMN2TSHRMEN1KMT2AEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9982157-B2 Aqueous laser-sensitive composition for marking substrates DATALASE LTD. (GB) 2018-05-29 US disclosed
EP-2349734-B1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD (GB) 2018-03-28 EP disclosed
US-9333786-B2 Laser-sensitive coating formulations DATALASE, LTD. (GB) 2016-05-10 US disclosed
US-9267042-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2016-02-23 US disclosed
US-20150361289-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD. (GB) 2015-12-17 US disclosed
US-20120045624-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2012-02-23 US disclosed
US-20110274893-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2011-11-10 US disclosed
US-8021820-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2011-09-20 US disclosed
EP-2349734-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-08-03 EP disclosed
EP-2342295-A1 COATING COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-07-13 EP disclosed
US-20100233447-A1 LASER-SENSITIVE COATING FORMULATIONS CIBA CORPORATION (US) 2010-09-16 US disclosed
WO-2010049281-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
WO-2010049282-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
EP-2167323-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (DE) 2010-03-31 EP disclosed
US-20090191420-A1 Coating Composition for Marking Substrates CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2009-07-30 US disclosed
WO-2009010405-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (CH) 2009-01-22 WO disclosed
EP-1981717-A1 COATING COMPOSITION FOR MARKING SUBSTRATES Ciba Holding Inc. (CH) 2008-10-22 EP disclosed
WO-2007088104-A1 COATING COMPOSITION FOR MARKING SUBSTRATES CIBA HOLDING INC. (CH) 2007-08-09 WO disclosed
US-5489501-A MIXTURES OF TWO COORDINATION COMPOUNDS WHICH REACT TO FORM NEW COORDINATION COMPOUND WHILE CAUSING VISIBLE COLOR CHANGES RICOH COMPANY, LTD. (JP) 1996-02-06 US disclosed
US-5446011-A Imagewise coloring when heating; mixture of n-substituted indole, aromatic polyhydroxy compound, carbonyl compound and an acid RICOH COMPANY, LTD. (JP) 1995-08-29 US disclosed