SCHEMBL66078

SCHEMBL66078

CC(C#N)N1CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64285 0.97 ALDH1A1 (0.38)
SCHEMBL3180035 0.97 ALDH1A1 (0.38)
SCHEMBL6830731 0.94
SCHEMBL3409567 0.88
SCHEMBL11597630 0.88 TSHR (0.39)
SCHEMBL26436014 0.81 KDM4E (0.33)
SCHEMBL10155184 0.79 MC4R (0.38)
SCHEMBL6625529 0.77 OPRD1 (0.37)
SCHEMBL65393 0.77 ALDH1A1 (0.43)
SCHEMBL9679875 0.77 OPRD1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 431 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743564-B2 A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-01 US claimed
EP-4660703-A2 METAL-CONTAINING FILM PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-20250372377-A1 METAL-CONTAINING FILM PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-04 US disclosed
US-12032287-B2 Resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-09 US disclosed
US-11994798-B2 Resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-28 US disclosed
CN-116925077-A Pyrido ring compound, and preparation method, intermediate, composition and application thereof 一又生物(上海)有限公司 2023-10-24 CN disclosed
US-20230212152-A1 INHIBITORS OF CYSTEINE PROTEASES AND METHODS OF USE THEREOF Pardes Biosciences, Inc. 2023-07-06 US disclosed
WO-2023115327-A1 PYRIDO RING COMPOUND, PREPARATION METHOD THEREFOR, INTERMEDIATE, COMPOSITION, AND APPLICATION 中国药科大学 2023-06-29 WO disclosed
CN-114149428-B Pyrido ring compound, and preparation method, intermediate, composition and application thereof 中国药科大学 2023-06-13 CN disclosed
CN-114149428-A Pyridine-fused ring compound and preparation method, intermediate, composition and application thereof 中国药科大学 2022-03-08 CN disclosed
US-20020115807-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed
US-20020115018-A1 Amine compounds, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed
US-20020115821-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed
US-20020102493-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-01 US disclosed
US-20020061463-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed
EP-1195390-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-10 EP disclosed
EP-0008482-B1 PROCESS FOR THE PREPARATION OF DELTA KETO-ACIDS AND DERIVATIVES THEREOF STAMICARBON B.V. (NL) 1983-04-20 EP disclosed
US-4267362-A Process for the preparation of delta keto-acids and derivatives thereof STAMICARBON, B.V. (NL) 1981-05-12 US disclosed
EP-0008482-A1 Process for the preparation of delta keto-acids and derivatives thereof STAMICARBON B.V. (NL) 1980-03-05 EP disclosed
US-4052553-A BACTERICIDE, ANTIMALARIAL BURROUGHS WELLCOME CO. (US) 1977-10-04 US disclosed