⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL66078 | 0.94 | — | — | |
| SCHEMBL3180035 | 0.92 | ALDH1A1 (0.38) | — | |
| SCHEMBL64285 | 0.92 | ALDH1A1 (0.38) | — | |
| SCHEMBL11597630 | 0.88 | TSHR (0.39) | — | |
| SCHEMBL3409567 | 0.88 | — | — | |
| SCHEMBL26436014 | 0.81 | KDM4E (0.33) | — | |
| SCHEMBL11155132 | 0.80 | — | — | |
| SCHEMBL10155184 | 0.79 | MC4R (0.38) | — | |
| SCHEMBL65393 | 0.77 | ALDH1A1 (0.43) | — | |
| SCHEMBL6625529 | 0.77 | OPRD1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | claimed |
| CN-116964049-A | Estrogen receptor modulators | 里科瑞尔姆IP控股有限责任公司 | 2023-10-27 | — | — | CN | disclosed |
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20020115018-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |