SCHEMBL662595

SCHEMBL662595

C=Cc1ccc(O)cc1C(C)(C)C

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.55
TYR P14679 3/20 0.55
ALOX15 P16050 2/20 0.55
LMNA P02545 2/20 0.55
NR1I2 O75469 1/20 0.55
CYP2C9 P11712 1/20 0.55
MIF P14174 1/20 0.55
HTT P42858 1/20 0.55
NFE2L2 Q16236 1/20 0.55
HSD17B10 Q99714 1/20 0.55
ESR2 Q92731 7/20 0.40
ESR1 P03372 6/20 0.40
ESRRB O95718 1/20 0.40
ESRRA P11474 1/20 0.40
TSHR P16473 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
GAA P10253 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
KDM4E B2RXH2 1/20 0.38
CYP1A2 P05177 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28829670 0.84 ALDH1A1 (0.50) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL3433495 0.80 TYR (0.55) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL3702783 0.80 APP (0.51) ALDH1A1TYRALOX15LMNANR1I2
Water SCHEMBL8605013 0.78 ALDH1A1 (0.53) ALDH1A1TYRALOX15LMNANR1I2
Water SCHEMBL8605007 0.78 ALDH1A1 (0.53) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL4077998 0.78 ALDH1A1 (0.39) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL29564019 0.78 ALDH1A1 (0.39) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL11661768 0.78 ALDH1A1 (0.40) ALDH1A1ALOX15LMNACYP2C9HTT
SCHEMBL15496926 0.77 KCNJ11 (0.40) ALDH1A1TYRALOX15LMNANR1I2
SCHEMBL5330678 0.76 PTGS1 (0.40) ALDH1A1NFE2L2TSHRTDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-20140227445-A1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
US-9012545-B2 Composition and method for preparing pattern on a substrate ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-04-21 US disclosed
US-8821738-B2 Thermal annealing process ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US disclosed
US-8821739-B2 High temperature thermal annealing process ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US disclosed
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US disclosed
US-20140227445-A1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US disclosed
US-20140061155-A1 Composition and method for preparing pattern on a substrate DOW GLOBAL TECHNOLOGIES LLC. (US) 2014-03-06 US disclosed
US-20140014002-A1 High temperature thermal annealing process DOW GLOBAL TECHNOLOGIES LLC (US) 2014-01-16 US disclosed
US-20140014001-A1 Thermal annealing process DOW GLOBAL TECHNOLOGIES LLC (US) 2014-01-16 US disclosed
US-8450418-B2 Methods of forming block copolymers, and block copolymer compositions MICRON TECHNOLOGY, INC. (US) 2013-05-28 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
CN-1234706-C Nitrogen-oxygen heterocyclic compound and preparation method thereof CHANGCHUN ARTIFICIAL RESIN FAC (CN) 2006-01-04 CN disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed
US-20050085634-A1 Azaoxa heterocyclic compound and method of preparing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2005-04-21 US disclosed
CN-1490318-A Nitrogen-oxygen heterocyclic compound and preparation method thereof 长春人造树脂厂股份有限公司 2004-04-21 CN disclosed
US-20040068084-A1 Azaoxa heterocyclic compound and method of preparing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2004-04-08 US disclosed
US-6211328-B1 IN PRESENCE OF AN ACID GUN EI CHEMICAL INDUSTRY CO., LTD (JP) 2001-04-03 US disclosed
EP-0057881-B1 AN ANTI-INFLAMMATORY, ANALGESIC, AND ANTIPYRETIC PHARMACEUTICAL COMPOSITION, AND METHOD FOR PRODUCING IT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1985-12-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040068084-A1 Azaoxa heterocyclic compound and method of preparing the same AOX1, KDM1A, BMI1 ALDH1A1 81/4885TYR 485/4885ALOX15 228/4885
US-20050085634-A1 Azaoxa heterocyclic compound and method of preparing the same AOX1, KDM1A, BMI1 ALDH1A1 116/4885TYR 314/4885ALOX15 219/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.