Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP3 | P05413 | 1/20 | 0.59 |
| ▸ | FABP4 | P15090 | 1/20 | 0.59 |
| ▸ | GABRA1 | P14867 | 4/20 | 0.52 |
| ▸ | CA1 | P00915 | 3/20 | 0.52 |
| ▸ | CA2 | P00918 | 3/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.52 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.52 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.52 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.52 |
| ▸ | FAAH | O00519 | 1/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.52 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.52 |
| ▸ | HTR2C | P28335 | 1/20 | 0.52 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.52 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4961934 | 0.87 | CA1 (0.61) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL1356418 | 0.87 | FABP3 (0.47) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL6235887 | 0.87 | TDP1 (0.49) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL17755148 | 0.86 | CES2 (0.48) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL10489985 | 0.86 | FABP3 (0.46) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL343203 | 0.86 | FABP3 (0.46) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL14564313 | 0.86 | ITGB1 (0.50) | FABP3FABP4GABRA1CA1CA2 | |
| Isopropyl Alcohol SCHEMBL8992570 | 0.84 | FABP3 (0.44) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL28217218 | 0.84 | FABP3 (0.44) | FABP3FABP4GABRA1CA1CA2 | |
| SCHEMBL28217225 | 0.84 | FABP3 (0.44) | FABP3FABP4GABRA1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107056587-B | Method for synthesizing L-menthol | 福建青松股份有限公司 | 2020-06-05 | — | — | CN | claimed |
| CN-107056587-A | A kind of method of synthesis L menthols | 福建青松股份有限公司 | 2017-08-18 | — | — | CN | claimed |
| CN-101003456-B | Method for preparing Beta, Gamma unsaturated ester | CHINA PETROCHEMICAL CORP | 2010-10-06 | — | — | CN | claimed |
| CN-101003456-A | Method for preparing Beta, Gamma unsaturated ester | CHINA PETROCHEMICAL CORP (CN) | 2007-07-25 | — | — | CN | claimed |
| US-6010975-A | Catalyst composition for preparing 3-pentenoic ester from butadiene | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2000-01-04 | — | — | US | claimed |
| US-20250162992-A1 | METHOD FOR PRODUCING AMIDE COMPOUND | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2025-05-22 | — | — | US | disclosed |
| EP-4461724-A1 | METHOD FOR PRODUCING AMIDE COMPOUND | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2024-11-13 | — | — | EP | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| EP-4276533-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |
| EP-0742208-A1 | 2-Ureido-benzamide derivatives | GRELAN PHARMACEUTICAL CO., LTD. (JP) | 1996-11-13 | — | — | EP | disclosed |
| US-5442060-A | Treating hyperlipemia, atherosclerosis | MITSUBISHI KASEI CORPORATION (JP) | 1995-08-15 | — | — | US | disclosed |
| EP-0625507-A2 | Urea derivatives and their use as acat inhibitors | NISSHIN FLOUR MILLING CO., LTD. (JP) | 1994-11-23 | — | — | EP | disclosed |
| EP-0591830-A1 | Carboxamide and urea derivatives having ACAT-inhibiting activityM | Mitsubishi Chemical Corporation (JP) | 1994-04-13 | — | — | EP | disclosed |
| EP-0507576-A1 | Polypropylene-based resin compositions | TOSOH CORPORATION (JP) | 1992-10-07 | — | — | EP | disclosed |
| US-3985797-A | Hydroxylation of aromatic compounds | UOP INC. (US) | 1976-10-12 | — | — | US | disclosed |
| US-3985796-A | Hydroxylation of aromatic compounds | UOP INC. (US) | 1976-10-12 | — | — | US | disclosed |
| US-3931295-A | Hydroxylation of aromatic compounds | UNIVERSAL OIL PRODUCTS COMPANY (US) | 1976-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250162992-A1 | METHOD FOR PRODUCING AMIDE COMPOUND | NAAA, NCAPH, NCAPD2 | FABP3 3421/4885FABP4 1877/4885GABRA1 3057/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.