Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 3/20 | 0.68 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.52 |
| ▸ | BACE1 | P56817 | 3/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 8/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.43 |
| ▸ | ESRRB | O95718 | 2/20 | 0.43 |
| ▸ | ESRRA | P11474 | 2/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | CRHBP | P24387 | 1/20 | 0.39 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL115174 | 0.77 | TTR (0.68) | TTRHSD17B10BACE1ESR1ESR2 | |
| SCHEMBL109034 | 0.76 | TDP1 (0.60) | HSD17B10ALDH1A1TSHRCYP3A4 | |
| SCHEMBL29376510 | 0.76 | TDP1 (0.60) | HSD17B10ALDH1A1TSHRCYP3A4 | |
| SCHEMBL29420732 | 0.76 | TYR (0.52) | TTRALDH1A1ESR1ESR2ESRRB | |
| SCHEMBL686136 | 0.76 | TYR (0.52) | TTRALDH1A1ESR1ESR2ESRRB | |
| SCHEMBL3757669 | 0.76 | TTR (0.65) | TTRHSD17B10BACE1ALDH1A1ESR1 | |
| SCHEMBL2439383 | 0.74 | ALDH1A1 (0.50) | TTRBACE1ALDH1A1TSHR | |
| SCHEMBL4020967 | 0.74 | ALDH1A1 (0.50) | TTRALDH1A1 | |
| Hydrogen Sulfide SCHEMBL29194425 | 0.74 | TDP1 (0.58) | HSD17B10ALDH1A1TSHRCYP3A4 | |
| SCHEMBL17548943 | 0.74 | TTR (0.63) | TTRHSD17B10BACE1ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114709406-B | Sulfur-rich copolymer material, lithium sulfur battery positive electrode material, and preparation methods and applications thereof | 中国电建集团成都勘测设计研究院有限公司 | 2023-07-25 | — | — | CN | claimed |
| CN-114709406-A | Sulfur-rich copolymer material, lithium-sulfur battery positive electrode material, and preparation methods and applications thereof | 中国电建集团成都勘测设计研究院有限公司 | 2022-07-05 | — | — | CN | claimed |
| US-8822619-B1 | Directed self assembly copolymer composition and related methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-09-02 | — | — | US | claimed |
| US-20140227445-A1 | Directed self assembly copolymer composition and related methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-08-14 | — | — | US | claimed |
| CN-103980648-A | Directed self assembly copolymer composition and related methods | DOW GLOBAL TECHNOLOGIES LLC | 2014-08-13 | — | — | CN | claimed |
| EP-3636678-B1 | POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF | HUBEI GURUN TECH CO LTD (CN) | 2024-01-17 | — | — | EP | disclosed |
| CN-114709406-B | Sulfur-rich copolymer material, lithium sulfur battery positive electrode material, and preparation methods and applications thereof | 中国电建集团成都勘测设计研究院有限公司 | 2023-07-25 | — | — | CN | disclosed |
| CN-114709406-A | Sulfur-rich copolymer material, lithium-sulfur battery positive electrode material, and preparation methods and applications thereof | 中国电建集团成都勘测设计研究院有限公司 | 2022-07-05 | — | — | CN | disclosed |
| CN-108255018-B | Photoresist composition comprising poly (p-hydroxystyrene) epoxy resin as film-forming resin | 湖北固润科技股份有限公司 | 2020-12-11 | — | — | CN | disclosed |
| CN-108864341-B | Poly (p-hydroxystyrene) epoxy resin, and synthesis and application thereof | 湖北固润科技股份有限公司 | 2020-10-13 | — | — | CN | disclosed |
| US-20200199273-A1 | POLY-P-HYDROXYSTYRENE EPOXY RESINS, SYNTHESIS AND APPLICATION THEREOF | Hubei Gurun Technology Co., Ltd (CN) | 2020-06-25 | — | — | US | disclosed |
| EP-3636678-A1 | POLY(P-HYDROXYSTYRENE) EPOXY RESIN, AND SYNTHESIS AND USE THEREOF | Hubei Gurun Technology Co., Ltd (CN) | 2020-04-15 | — | — | EP | disclosed |
| US-8304493-B2 | Methods of forming block copolymers | MICRON TECHNOLOGY, INC. (US) | 2012-11-06 | — | — | US | disclosed |
| US-20120046415-A1 | METHODS OF FORMING BLOCK COPOLYMERS, METHODS OF FORMING A SELF-ASSEMBLED BLOCK COPOLYMER STRUCTURE AND RELATED COMPOSITIONS | MICRON TECHNOLOGY, INC. (US) | 2012-02-23 | — | — | US | disclosed |
| EP-2289883-A1 | Novel FXR (NR1H4) binding and activity modulating compounds | Phenex Pharmaceuticals AG (DE) | 2011-03-02 | — | — | EP | disclosed |
| US-7416821-B2 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2008-08-26 | — | — | US | disclosed |
| US-20050238997-A1 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2005-10-27 | — | — | US | disclosed |
| US-6329122-B2 | TREATING ANODIZED SUBSTRATE WITH ACIDIC AQUESOUS SOLUTION; ALUMINUM HYDROXIDE BY-PRODUCT INHIBITION DURING RINSING | FUJI PHOTO FILM CO., LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010010891-A1 | PROCESS FOR THE PREPARATION OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2001-08-02 | — | — | US | disclosed |
| EP-1013469-A1 | Process for the preparation of photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-28 | — | — | EP | disclosed |