Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6651406

Fc1c(F)c(F)c([S+](c2ccccc2)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.42

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Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 2/20 0.42
PTPN1 P18031 1/20 0.35
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA5A P35218 1/20 0.32
CA9 Q16790 1/20 0.32
KCNH2 Q12809 6/20 0.31
ACHE P22303 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL31155703 0.85 GPR3 (0.50) GPR3PTPN1CA1CA2CA5A
Trifluoromethanesulfonic Acid SCHEMBL37032 0.85 GPR3 (0.50) GPR3PTPN1CA1CA2CA5A
Trifluoromethanesulfonic Acid SCHEMBL10008137 0.83 GPR3 (0.48) GPR3PTPN1CA1CA2CA5A
Trifluoromethanesulfonic Acid SCHEMBL6118365 0.83 GPR3 (0.48) GPR3PTPN1CA1CA2CA5A
SCHEMBL1963304 0.81 GAA (0.30)
Trifluoromethanesulfonic Acid SCHEMBL3130151 0.81 GPR3 (0.43) GPR3PTPN1
Trifluoromethanesulfonic Acid SCHEMBL51183 0.81 GPR3 (0.43) GPR3PTPN1
Trifluoromethanesulfonic Acid SCHEMBL3249775 0.79 GPR3 (0.44) GPR3PTPN1CA1CA2CA5A
Trifluoromethanesulfonic Acid SCHEMBL3836977 0.78 GPR3 (0.41) GPR3PTPN1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL31049631 0.78 GPR3 (0.41) GPR3PTPN1CA1CA2CA5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6811961-B2 PHOTORESIST RELEIF IMAGES; MIXTURE OF RESIN AND ACID GENERATORS SHIPLEY COMPANY, L.L.C. 2004-11-02 US disclosed
WO-2002069039-A9 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY CO LLC (US) 2004-05-06 WO disclosed
US-6664022-B1 Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development SHIPLEY COMPANY, L.L.C. 2003-12-16 US disclosed
US-20030013049-A1 Photoacid generator systems for short wavelength imaging SHIPLEY COMPANY, L.L.C. 2003-01-16 US disclosed
WO-2002069039-A2 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-09-06 WO disclosed
WO-2002019033-A2 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2002-03-07 WO disclosed