SCHEMBL6656491

SCHEMBL6656491

O=C(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)(F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.40
GAA P10253 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TSHR P16473 3/20 0.39
POLB P06746 3/20 0.39
MAPK1 P28482 3/20 0.39
HTT P42858 2/20 0.38
MAPT P10636 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HSD17B10 Q99714 1/20 0.38
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
ABCC9 O60706 1/20 0.38
ABCC8 Q09428 1/20 0.38
KCNJ11 Q14654 1/20 0.38
KCNJ8 Q15842 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4967080 0.92 HSD11B1 (0.39) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL545781 0.89 HSD11B1 (0.38) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL1573977 0.88 CA1 (0.43) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL4964033 0.87 HDAC1 (0.39) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL4962467 0.86 CA1 (0.45) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL4964420 0.86 CA1 (0.45) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL4962506 0.86 CA1 (0.45) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL4962907 0.86 CA1 (0.45) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL14674381 0.85 HSD11B1 (0.40) HSD11B1GAAL3MBTL1TSHRPOLB
SCHEMBL107134 0.85 CES1 (0.42) HSD11B1GAAL3MBTL1TSHRPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1434091-A1 CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION Clariant International Ltd. (CH) 2004-06-30 EP disclosed
US-20040033438-A1 Chemical-amplication-type positive radiation-sensitive resin composition AZ ELECTRONIC MATERIALS USA CORP. 2004-02-19 US disclosed