Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 6/20 | 0.43 |
| ▸ | CA2 | P00918 | 6/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.35 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.35 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.35 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4962467 | 0.98 | CA1 (0.45) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL4964420 | 0.98 | CA1 (0.45) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL4962506 | 0.98 | CA1 (0.45) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL4962907 | 0.98 | CA1 (0.45) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL545781 | 0.95 | HSD11B1 (0.38) | CA1CA2HSD11B1NR1H2GAA | |
| SCHEMBL4964033 | 0.93 | HDAC1 (0.39) | CA1CA2HSD11B1GAAL3MBTL1 | |
| SCHEMBL4961881 | 0.90 | CA2 (0.42) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL4965786 | 0.90 | CA2 (0.42) | CA1CA2THRBHSD11B1NR1H2 | |
| SCHEMBL6656491 | 0.88 | HSD11B1 (0.40) | HSD11B1NR1H2GAAL3MBTL1TSHR | |
| SCHEMBL4967080 | 0.88 | HSD11B1 (0.39) | HSD11B1GAAL3MBTL1TSHRPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2278399-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2013-05-15 | — | — | EP | disclosed |
| EP-1626309-B1 | Hologram recording material, hologram recording method and holographic optical element | FUJIFILM CORP (JP) | 2011-07-27 | — | — | EP | disclosed |
| EP-1492092-B1 | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method | FUJIFILM CORP (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-20100239962-A1 | TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7771915-B2 | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method | FUJIFILM CORPORATION (JP) | 2010-08-10 | — | — | US | disclosed |
| EP-2180467-A1 | Photon-mode recording method | Fujifilm Corporation (JP) | 2010-04-28 | — | — | EP | disclosed |
| US-7588863-B2 | Hologram recording method and hologram recording material | FUJIFILM CORPORATION (JP) | 2009-09-15 | — | — | US | disclosed |
| US-7582390-B2 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-7582391-B2 | Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-7572555-B2 | Hologram recording material, hologram recording method and optical recording medium | FUJIFILM CORPORATION (JP) | 2009-08-11 | — | — | US | disclosed |
| EP-1480079-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-6811947-B2 | RESIN, WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20040009430-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-20040005512-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2004-01-08 | — | — | US | disclosed |
| EP-1376232-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1367440-A2 | Positive-working resist composition | Fuji Photo Film Co., Ltd. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-20030203308-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| US-20030194641-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-10-16 | — | — | US | disclosed |
| US-6485883-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |