Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.74 |
| ▸ | CES2 | O00748 | 3/20 | 0.74 |
| ▸ | CES1 | P23141 | 3/20 | 0.74 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.67 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.50 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.49 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.49 |
| ▸ | TP53 | P04637 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL28119739 | 0.93 | LMNA (0.70) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28292944 | 0.92 | CES2 (0.81) | LMNACES2CES1ALDH1A1KDM4E | |
| SCHEMBL66803 | 0.92 | LMNA (0.74) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28140114 | 0.91 | CES2 (0.78) | LMNACES2CES1ALDH1A1KDM4E | |
| SCHEMBL66875 | 0.90 | CES2 (0.58) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL11863287 | 0.87 | LMNA (0.66) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28395166 | 0.86 | LMNA (0.70) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL4557692 | 0.86 | LMNA (0.91) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL901258 | 0.86 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL145 | 0.86 | CES2 (1.00) | LMNACES2CES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117434177-A | Corn storage year identification method | 国家粮食和物资储备局科学研究院 | 2024-01-23 | — | — | CN | claimed |
| US-4524221-A | REACTING A GRIGNARD REAGENT WITH SILYLATED CYANOHYDRIN, TREATING WITH AQUEOUS ACID | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-18 | — | — | US | claimed |
| JP-6239910-A | — | — | None | — | — | JP | disclosed |
| CN-118142442-A | Hydrogenation system and hydrogenation method | 中国石油化工股份有限公司 | 2024-06-07 | — | — | CN | disclosed |
| US-20230130025-A1 | PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2023-04-27 | — | — | US | disclosed |
| US-20230130025-A1 | PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2023-04-27 | — | — | US | disclosed |
| CN-110078657-A | A kind of synthetic method of chirality 3- amino piperidine and its derivative | 湖州复华春生物医药科技有限公司 | 2019-08-02 | — | — | CN | disclosed |
| CN-107207395-A | The manufacture method of p-methylbenzoic acid | 东丽株式会社 | 2017-09-26 | — | — | CN | disclosed |
| US-8129087-B2 | Block copolymer and substrate processing method | CANON KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7776509-B2 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | CANON KABUSHIKI KAISHA (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090311637-A1 | BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD | CANON KABUSHIKI KAISHA (JP) | 2009-12-17 | — | — | US | disclosed |
| US-5484689-A | SUBSTRATE WITH OPTICAL RECORDING LAYER AND COLORLESSS DYE | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 1996-01-16 | — | — | US | disclosed |
| JP-H06239910-A | PHOTOPOLYMERIZATION INITIATOR | NIPPON PAINT CO LTD | 1994-08-30 | — | — | JP | disclosed |
| EP-0564282-A2 | Bis-dithiobenzilnickel complexes for usae in near-infrared absorbing materials and benzoin derivatives as intermediates therefor | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 1993-10-06 | — | — | EP | disclosed |
| US-4891297-A | STORAGE STABILITY, HIGH COLOR DENSITY | FUJI PHOTO FILM CO.,LTD. (JP) | 1990-01-02 | — | — | US | disclosed |
| US-4783393-A | UNSYMMETRICAL BIS/1,2-DIPHENYL-1,2-ETHANEDITHIOLATO/2-/-S,S*/-PLATINUM COMPOUNDS | EASTMAN KODAK COMPANY (US) | 1988-11-08 | — | — | US | disclosed |
| US-4556723-A | SILYLATED GRIGNARD REAGENT AS INTERMEDIATE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-12-03 | — | — | US | disclosed |
| US-4524221-A | REACTING A GRIGNARD REAGENT WITH SILYLATED CYANOHYDRIN, TREATING WITH AQUEOUS ACID | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-18 | — | — | US | disclosed |
| US-4190602-A | PHOTOCHEMICAL SENSITIZERS BY REACTION OF SULFUROUS ACID ESTER OR THIONYL CHLORIDE AND A PRIMARY ALCOHOL | CIBA-GEIGY CORPORATION (US) | 1980-02-26 | — | — | US | disclosed |
| US-3937722-A | PHOTOSENSITIZERS, IRRADIATION POLYMERIZATION, CROSSLINKING | BAYER AG (DT) | 1976-02-10 | — | — | US | disclosed |