Benzoin

Benzoin

SCHEMBL28292944

Cc1ccccc1.O=C(c1ccccc1)C(O)c1ccccc1

nearest known ligand 0.81

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.81
CES1 P23141 4/20 0.81
LMNA P02545 3/20 0.81
ALDH1A1 P00352 2/20 0.62
KDM4E B2RXH2 1/20 0.62
TDP1 Q9NUW8 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
MAPK1 P28482 1/20 0.52
CYP3A4 P08684 1/20 0.47
HPGD P15428 1/20 0.47
KEAP1 Q14145 1/20 0.45
NFE2L2 Q16236 1/20 0.45
MEN1 O00255 1/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
KMT2A Q03164 1/20 0.44
NPSR1 Q6W5P4 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoin SCHEMBL28140114 0.98 CES2 (0.78) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL28395166 0.93 LMNA (0.70) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL66803 0.92 LMNA (0.74) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL66647 0.92 LMNA (0.74) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL4557692 0.90 LMNA (0.91) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL2025536 0.90 CES2 (1.00) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL901258 0.90 CES2 (1.00) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL145 0.90 CES2 (1.00) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL10665271 0.90 CES2 (1.00) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL5833429 0.90 CES2 (1.00) CES2CES1LMNAALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110361931-A Antireflective hardmask composition HNS股份有限公司 2019-10-22 CN claimed
CN-118256177-A Composition for forming adhesive layer, laminate, method for producing adhesive layer, method for producing laminate, and method for treating laminate 日铁化学材料株式会社 2024-06-28 CN disclosed
CN-111596524-B Self-luminous photosensitive composition, color conversion layer, color filter and image display device 东友精细化工有限公司 2024-01-30 CN disclosed
CN-111638629-B Colored resin composition, optical filter formed from the same, and display device including the optical filter 住华科技股份有限公司 2023-11-10 CN disclosed
CN-111670409-B Colored photosensitive resin composition 住友化学株式会社 2023-08-18 CN disclosed
CN-113383021-B Colored curable resin composition 住友化学株式会社 2023-08-15 CN disclosed
CN-113439092-B Colored curable resin composition, color filter and display device 住友化学株式会社 2023-07-21 CN disclosed
CN-111624853-B Colored resin composition, color filter using the same, and display device 住华科技股份有限公司 2023-07-14 CN disclosed
CN-116323698-A Curable composition 住友化学株式会社 2023-06-23 CN disclosed
CN-116234878-A Coloring composition 住友化学株式会社 2023-06-06 CN disclosed
CN-102645844-B Colored curable resin composition 住友化学株式会社 2016-08-10 CN disclosed
CN-104752171-A Gap Filling Materials and Methods TAIWAN SEMICONDUCTOR MFG 2015-07-01 CN disclosed
CN-101573868-B Surface acoustic wave device and method for manufacturing the same KYOCERA CORP 2012-05-30 CN disclosed
CN-101432139-B Bakeable lithographic plate with a high resistance to chemicals EASTMAN KODAK CO 2011-05-04 CN disclosed
CN-101573868-A Surface acoustic wave device and method for manufacturing the same KYOCERA CORP (JP) 2009-11-04 CN disclosed
CN-101541536-A Apparatus and method for manufacturing a security product CIBA HOLDING INC (CH) 2009-09-23 CN disclosed
CN-101432139-A Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2009-05-13 CN disclosed
CN-1674293-A Memory devices based on electric field programmable films ROHM & HAAS (US) 2005-09-28 CN disclosed
CN-1580954-A Photosensitive resin composition and transparent material for colour filter made therefrom SUMITOMO CHEMICAL CO (JP) 2005-02-16 CN disclosed
CN-1332205-A Radiation-sensitive resin composition JSR CORP (JP) 2002-01-23 CN disclosed