SCHEMBL6667943

SCHEMBL6667943

C=C(C)COC(=C)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1463502 0.74
SCHEMBL22830358 0.72 TSHR (0.38)
SCHEMBL1034236 0.70
SCHEMBL11123701 0.70 TSHR (0.41)
SCHEMBL1976400 0.70 ALDH1A1 (0.43)
SCHEMBL7572266 0.70
SCHEMBL868205 0.70 HCAR2 (0.43)
SCHEMBL10688847 0.70 HCAR2 (0.43)
SCHEMBL6957678 0.70
SCHEMBL11549997 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1057843-B1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE KOGYO KK (JP) 2004-09-15 EP disclosed
US-6306947-B1 Printing ink and paint composed of an aqueous emulsion of self-emulsifiable urethane copolymer NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2001-10-23 US disclosed
EP-1057843-A1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE INDUSTRY CO. LTD. (JP) 2000-12-06 EP disclosed