SCHEMBL666878

SCHEMBL666878

Cc1n(CCO)cc[n+]1C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.51
CA2 P00918 4/20 0.51
ACHE P22303 2/20 0.44
HDAC8 Q9BY41 4/20 0.35
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
EEF2K O00418 2/20 0.31
EEF2 P13639 2/20 0.31
MEN1 O00255 1/20 0.31
PLK4 O00444 1/20 0.31
JAK2 O60674 1/20 0.31
EGFR P00533 1/20 0.31
TYK2 P29597 1/20 0.31
FLT3 P36888 1/20 0.31
BLM P54132 1/20 0.31
KMT2A Q03164 1/20 0.31
ITK Q08881 1/20 0.31
PIM2 Q9P1W9 1/20 0.31
POLB P06746 1/20 0.30
APOBEC3A P31941 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL15318972 0.98 CA1 (0.50) CA1CA2ACHEHDAC8ALDH1A1
SCHEMBL28404964 0.93 CA1 (0.46) CA1CA2ACHEHDAC8
SCHEMBL17422678 0.93 CA1 (0.46) CA1CA2ACHEHDAC8LMNA
SCHEMBL22372285 0.88 CA1 (0.45) CA1CA2ACHEHDAC8EEF2K
SCHEMBL666911 0.87 CA1 (0.42) CA1CA2ACHEHDAC8
SCHEMBL14988896 0.86 CA1 (0.44) CA1CA2ACHEHDAC8ALDH1A1
SCHEMBL28808933 0.81 HTT (0.47) CA1CA2ACHELMNAMEN1
SCHEMBL2400202 0.79 ACHE (0.44) CA1CA2ACHEHDAC8EEF2K
Fluoride Ion SCHEMBL21980194 0.79 ACHE (0.44) CA1CA2ACHEHDAC8LMNA
Hydrochloric Acid SCHEMBL1884666 0.79 ACHE (0.47) CA1CA2ACHEHDAC8ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111395054-A Flexible transparent conductive hydrophobic paper and preparation method thereof 深圳市旺盈彩盒纸品有限公司 2020-07-10 CN claimed
EP-3167005-A1 ELECTRICALLY CONDUCTIVE POLYMER COMPLEXES AND ELECTRONIC DEVICES CONTAINING SUCH COMPLEXES Rhodia Operations (FR) 2017-05-17 EP claimed
WO-2016007746-A1 ELECTRICALLY CONDUCTIVE POLYMER COMPLEXES AND ELECTRONIC DEVICES CONTAINING SUCH COMPLEXES RHODIA OPERATIONS (FR) 2016-01-14 WO claimed
US-8784690-B2 Polymer compositions, polymer films, polymer gels, polymer foams, and electronic devices containing such films, gels and foams RHODIA OPERATIONS (FR) 2014-07-22 US claimed
EP-2606491-A1 FILMS CONTAINING ELECTRICALLY CONDUCTIVE POLYMERS Rhodia Operations (FR) 2013-06-26 EP claimed
EP-2606530-A2 POLYMER COMPOSITIONS, POLYMER FILMS, POLYMER GELS, POLYMER FOAMS, AND ELECTRONIC DEVICES CONTAINING SUCH FILMS, GELS, AND FOAMS Rhodia Operations (FR) 2013-06-26 EP claimed
US-20120052395-A1 Polymer compositions, polymer films, polymer gels, polymer foams, and electronic devices containing such films, gels and foams CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2012-03-01 US claimed
WO-2012023989-A2 POLYMER COMPOSITIONS, POLYMER FILMS, POLYMER GELS, POLYMER FOAMS, AND ELECTRONIC DEVICES CONTAINING SUCH FILMS, GELS, AND FOAMS RHODIA OPERATIONS (FR) 2012-02-23 WO claimed
WO-2012023992-A1 FILMS CONTAINING ELECTRICALLY CONDUCTIVE POLYMERS RHODIA OPERATIONS (FR) 2012-02-23 WO claimed
US-20120043530-A1 Polymer compositions, polymer films, polymer gels, polymer foams, and electronic devices containing such films, gels and foams CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2012-02-23 US claimed
US-12466956-B2 Electroconductive resin composition and molded article of same DENKA COMPANY LIMITED (JP) 2025-11-11 US disclosed
WO-2022009445-A9 ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED ARTICLE 三洋化成工業株式会社 2025-01-16 WO disclosed
EP-4159824-B1 ANTISTATIC AGENT, ANTISTATIC RESIN COMPOSITION, AND MOLDED PRODUCT SANYO CHEMICAL IND LTD (JP) 2025-01-01 EP disclosed
CN-115768850-B Antistatic agent, antistatic resin composition and molded article 三洋化成工业株式会社 2024-07-09 CN disclosed
CN-115698220-B Antistatic agent, antistatic resin composition and molded article 三洋化成工业株式会社 2024-05-07 CN disclosed
EP-1564768-A1 ELECTROLYTE FOR ELECTROLYTIC CAPACITOR, ELECTROLYTIC CAPACITOR AND PROCESS FOR PRODUCING TETRAFLUOROALUMINATE SALT OF ORGANIC ONIUM Mitsubishi Chemical Corporation (JP) 2005-08-17 EP disclosed
US-20050136247-A1 Non-aqueous absorbent and use thereof SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2005-06-23 US disclosed
EP-1462460-A1 NON-AQUEOUS ABSORBENT AND USE THEREOF SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-29 EP disclosed
US-20040095708-A1 Electrolyte for electolytic capacitor and electrolytic capacitor using the same MITSUBISHI CHEMICAL CORPORATION (JP) 2004-05-20 US disclosed
EP-1394824-A1 ELECTROLYTIC SOLUTION FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR USING IT Mitsubishi Chemical Corporation (JP) 2004-03-03 EP disclosed