⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL6671443 | 0.73 | LMNA (0.31) | — | |
| SCHEMBL1591922 | 0.70 | ALOX15 (0.33) | — | |
| SCHEMBL8027299 | 0.67 | — | — | |
| SCHEMBL4442384 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL22769642 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL23295977 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL1649604 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL20721720 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL8478851 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL1171547 | 0.67 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | claimed |
| US-20130177848-A1 | Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2013-07-11 | — | — | US | disclosed |
| JP-2004339521-A | ACRYLATE OR METHACRYLATE OF 2-HYDROXY-3-PINANONE AND ITS POLYMER OR COPOLYMER | TOKYO OHKA KOGYO CO LTD | 2004-12-02 | — | — | JP | disclosed |