SCHEMBL6673086

SCHEMBL6673086

CCCC(C1C=Cc2ccccc21)C1C=Cc2ccccc21

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.36
HTR6 P50406 1/20 0.36
SIGMAR1 Q99720 6/20 0.35
KDM4E B2RXH2 2/20 0.33
BRD4 O60885 1/20 0.33
CCL2 P13500 1/20 0.33
LMNA P02545 1/20 0.33
TP53 P04637 1/20 0.33
CHRM2 P08172 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CHRM1 P11229 1/20 0.33
DRD2 P14416 1/20 0.33
ADRA2B P18089 1/20 0.33
ADRA2C P18825 1/20 0.33
NFKB1 P19838 1/20 0.33
CHRM3 P20309 1/20 0.33
SLC6A2 P23975 1/20 0.33
HTR2C P28335 1/20 0.33
ADRA1A P35348 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6675368 0.90 HTR2A (0.35) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL6675767 0.88 HTR2A (0.37) HTR2AHTR6SIGMAR1KDM4EBRD4
Hydrochloric Acid SCHEMBL8676551 0.87 KDM4E (0.33) HTR2AHTR6SIGMAR1KDM4EBRD4
Hydrochloric Acid SCHEMBL8676548 0.87 KDM4E (0.36) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL1921591 0.85 HTR2A (0.38) HTR2AHTR6SIGMAR1KDM4EBRD4
Hydrochloric Acid SCHEMBL8674947 0.85 KDM4E (0.33) HTR2AHTR6KDM4ELMNATP53
Hydrochloric Acid SCHEMBL8674949 0.85 BCHE (0.32) HTR2AHTR6KDM4ELMNATP53
SCHEMBL30084524 0.84 SIGMAR1 (0.36) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL9860034 0.84 HTR2A (0.37) HTR2AHTR6SIGMAR1KDM4EBRD4
SCHEMBL4651680 0.83 KDM4E (0.33) HTR2AHTR6SIGMAR1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0963990-B1 PROCESS FOR PRODUCING CYCLOPENTADIENYL METAL SALTS AND PROCESS FOR PRODUCING CYCLOPENTADIENE DERIVATIVES BY UTILIZING THE SAME SUMITOMO CHEMICAL CO (JP) 2004-10-06 EP disclosed
US-6197990-B1 REACTING CYCLOPENTADIENE AND METAL HYDRIDE IN PRESENCE OF AMINE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-03-06 US disclosed
EP-0963990-A1 PROCESS FOR PRODUCING CYCLOPENTADIENYL METAL SALTS AND PROCESS FOR PRODUCING CYCLOPENTADIENE DERIVATIVES BY UTILIZING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-15 EP disclosed