SCHEMBL6673099

SCHEMBL6673099

Sc1ccccc1-c1cccs1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.47
RAB9A P51151 5/20 0.41
NPC1 O15118 4/20 0.41
ATM Q13315 1/20 0.41
LTK P29376 1/20 0.41
CDK5 Q00535 1/20 0.41
MST1R Q04912 1/20 0.41
DYRK1A Q13627 1/20 0.41
CLK4 Q9HAZ1 1/20 0.41
ALDH1A1 P00352 6/20 0.40
KDM4E B2RXH2 5/20 0.40
HPGD P15428 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 2/20 0.40
ADORA2A P29274 1/20 0.40
ADORA1 P30542 1/20 0.40
TDO2 P48775 1/20 0.40
MEN1 O00255 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28195624 0.98 LTA4H (0.46) LTA4HRAB9ANPC1ATMLTK
SCHEMBL28195620 0.98 LTA4H (0.46) LTA4HRAB9ANPC1ATMLTK
SCHEMBL995326 0.83 LTA4H (0.55) LTA4HRAB9ANPC1ATMLTK
SCHEMBL752786 0.81 LTK (0.41) LTA4HRAB9ANPC1ATMLTK
Hydrogen Sulfide SCHEMBL752785 0.80 LTA4H (0.53) LTA4HRAB9ANPC1ATMLTK
SCHEMBL24181830 0.79 LTK (0.40) LTA4HRAB9ANPC1LTKCDK5
SCHEMBL14190039 0.74 LTA4H (0.48) LTA4HRAB9ANPC1ATMLTK
SCHEMBL27858670 0.74 MAOA (0.48) LTA4HRAB9ANPC1ATMALDH1A1
SCHEMBL27657179 0.74 MAOA (0.48) LTA4HRAB9ANPC1ALDH1A1KDM4E
SCHEMBL28085233 0.74 POLB (0.41) RAB9ANPC1ATMALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106700130-B A kind of composite modified melamine cyanurate flame retardant and its preparation method and application 湖州利鹏新材料科技有限公司 2019-06-21 CN claimed
CN-106633062-B A kind of polyphenylene sulfide of low chlorine content and preparation method thereof, resin combination and formed body 浙江新和成特种材料有限公司 2018-12-28 CN claimed
CN-103080181-A Curable resin composition DOW GLOBAL TECHNOLOGIES LLC 2013-05-01 CN claimed
CN-102985459-A curable resin composition DOW GLOBAL TECHNOLOGIES LLC 2013-03-20 CN claimed
EP-3677617-B1 PREPARATION METHOD FOR POLYPHENYLENE SULFIDE AND POLYPHENYLENE SULFIDE PREPARED BY MEANS OF SAME ZHEJIANG NHU CO LTD (CN) 2023-06-07 EP disclosed
CN-112921345-B Direct electrochemical synthesis method of thiophosphate compound 浙江工业大学 2022-04-19 CN disclosed
CN-112779554-B Indirect electrochemical synthesis method of thiophosphate compound 浙江工业大学 2022-04-01 CN disclosed
CN-112921345-A Direct electrochemical synthesis method of thiophosphate compound 浙江工业大学 2021-06-08 CN disclosed
CN-112779554-A Indirect electrochemical synthesis method of thiophosphate compound 浙江工业大学 2021-05-11 CN disclosed
CN-108499606-B O-mercapto aryl nitrogen heterocyclic carbene metal complex catalyst and preparation method and application thereof 万华化学集团股份有限公司 2020-11-20 CN disclosed
CN-111116645-A Synthesis method of thiophosphate compound 浙江工业大学 2020-05-08 CN disclosed
CN-108129368-B 4- thiophenyl-benzenethiol preparation method 浙江新和成股份有限公司 2019-06-18 CN disclosed
CN-101068770-B Process for producing 6-substituted-1-methyl-1-H-benzimidazole derivative and synthetic intermediate therefor SANKYO CO 2012-01-04 CN disclosed
CN-101068770-A Process for producing 6-substituted-1-methyl-1-H-benzimidazole derivative and synthetic intermediate therefor SANKYO CO (JP) 2007-11-07 CN disclosed
US-6811961-B2 PHOTORESIST RELEIF IMAGES; MIXTURE OF RESIN AND ACID GENERATORS SHIPLEY COMPANY, L.L.C. 2004-11-02 US disclosed
WO-2002069039-A9 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY CO LLC (US) 2004-05-06 WO disclosed
US-6664022-B1 Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development SHIPLEY COMPANY, L.L.C. 2003-12-16 US disclosed
US-20030013049-A1 Photoacid generator systems for short wavelength imaging SHIPLEY COMPANY, L.L.C. 2003-01-16 US disclosed
WO-2002069039-A2 PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-09-06 WO disclosed
WO-2002019033-A2 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME SHIPLEY COMPANY, L.L.C. (US) 2002-03-07 WO disclosed