Methacrylic Acid

Methacrylic Acid

SCHEMBL6678142

C=C(C)C(=O)[O-].CC(O)C[N+](C)(C)C

nearest known ligand 0.47

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A16 Q86VW1 1/20 0.47
TSHR P16473 3/20 0.41
CHRM2 P08172 2/20 0.41
CHRM4 P08173 2/20 0.41
CHRM1 P11229 2/20 0.41
TBXA2R P21731 1/20 0.41
MAPT P10636 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
CPT2 P23786 1/20 0.39
CPT1A P50416 1/20 0.39
GALR3 O60755 1/20 0.39
BLM P54132 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
CYP1A2 P05177 1/20 0.39
HRH1 P35367 1/20 0.39
CRAT P43155 1/20 0.39
LMNA P02545 3/20 0.35
CHRM5 P08912 1/20 0.35
CHRM3 P20309 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL29064100 0.98 SLC22A16 (0.45) SLC22A16TSHRCHRM2CHRM4CHRM1
Acetic Acid SCHEMBL5670671 0.87 SLC22A16 (0.54) SLC22A16TSHRCHRM2CHRM4CHRM1
Methacrylic Acid SCHEMBL27466382 0.85 MAPT (0.43) SLC22A16TSHRCHRM2CHRM4CHRM1
Acetic Acid SCHEMBL11505398 0.85 SLC22A16 (0.52) SLC22A16TSHRCHRM2CHRM4CHRM1
Acetic Acid SCHEMBL11505402 0.85 SLC22A16 (0.52) SLC22A16TSHRCHRM2CHRM4CHRM1
Acetic Acid SCHEMBL31405638 0.85 SLC22A16 (0.52) SLC22A16TSHRCHRM2CHRM4CHRM1
Bicarbonate SCHEMBL28323257 0.84 SLC22A16 (0.56) SLC22A16TSHRCHRM2CHRM4CHRM1
Methacrylic Acid SCHEMBL25248517 0.83 MAPT (0.42) SLC22A16TSHRCHRM2CHRM4CHRM1
Methacrylic Acid SCHEMBL7979734 0.83 MAPT (0.47) SLC22A16TSHRCHRM2CHRM4CHRM1
Bicarbonate SCHEMBL8320369 0.82 SLC22A16 (0.54) SLC22A16TSHRCHRM2CHRM4CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107531847-B Silicone-based hydrophilic copolymer and hydrogel composition including the same 莫门蒂夫性能材料股份有限公司 2021-10-08 CN claimed
CN-118234875-A Preparation method and sequencing method of nanopore biosensor 深圳华大生命科学研究院 2024-06-21 CN disclosed
CN-106896422-B Silicone hydrogel lenses with nanotextured surfaces 爱尔康公司 2021-03-23 CN disclosed
US-20150075399-A1 RESIN COMPOSITION FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2015-03-19 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed
US-5614354-A Method of forming positive polyimide patterns TORAY INDUSTRIES, INC. (JP) 1997-03-25 US disclosed
EP-0634698-A1 PROCESS FOR FORMING POSITIVE POLYIMIDE PATTERN TORAY INDUSTRIES, INC. (JP) 1995-01-18 EP disclosed