SCHEMBL6680951

SCHEMBL6680951

NCCc1ccc(S(=O)(=O)c2ccc(CCN)cc2)cc1

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 5/20 0.84
CA2 P00918 3/20 0.72
CA12 O43570 2/20 0.72
CA1 P00915 2/20 0.72
CA4 P22748 2/20 0.72
CA6 P23280 2/20 0.72
CA5A P35218 2/20 0.72
CA7 P43166 2/20 0.72
CA9 Q16790 2/20 0.72
CA14 Q9ULX7 2/20 0.72
CA5B Q9Y2D0 2/20 0.72
F2 P00734 2/20 0.69
TMPRSS4 Q9NRS4 2/20 0.69
TSHR P16473 2/20 0.69
CYP1A2 P05177 2/20 0.69
TP53 P04637 1/20 0.69
CYP2D6 P10635 1/20 0.69
LMNA P02545 1/20 0.54
MPO P05164 1/20 0.54
CYP3A4 P08684 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL142107 0.84 CA2 (1.00) HTR6CA2CA12CA1CA4
SCHEMBL852835 0.82 CA2 (0.67) HTR6CA2CA12CA1CA4
Potassium Ion SCHEMBL11742565 0.82 CA2 (0.67) HTR6CA2CA12CA1CA4
SCHEMBL77781 0.82 F2 (1.00) HTR6CA2CA12CA1CA4
SCHEMBL1251844 0.82 CA2 (0.67) HTR6CA2CA12CA1CA4
SCHEMBL4101241 0.82 CA2 (0.67) HTR6CA2CA12CA1CA4
SCHEMBL1806678 0.82 CA2 (0.67) HTR6CA2CA12CA1CA4
Hydrochloric Acid SCHEMBL2352021 0.82 CA2 (0.96) HTR6CA2CA12CA1CA4
Hydrochloric Acid SCHEMBL4372140 0.80 F2 (0.66) HTR6CA2CA12CA1CA4
SCHEMBL4101244 0.80 CA2 (0.64) HTR6CA2CA12CA1CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200239771-A1 ETCHING SOLUTION FOR SILICON SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME OCI COMPANY LTD. (KR) 2020-07-30 US disclosed
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
CN-1267501-C Light sensitivity resin precursor compsn. TORAY INDUSTRIES (JP) 2006-08-02 CN disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
CN-1154708-C Chemical-ray sensitive polymer composition 东丽株式会社 2004-06-23 CN disclosed
CN-1480491-A Light sensitivity resin precursor compsn. ������������ʽ���� 2004-03-10 CN disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
CN-1201061-A Chemical-ray sensitive polymer composition TORAY CO LTD (JP) 1998-12-09 CN disclosed