Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | PRKCA | P17252 | 7/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | TK1 | P04183 | 1/20 | 0.32 |
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
| ▸ | ENO1 | P06733 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17404452 | 0.88 | L3MBTL1 (0.36) | L3MBTL1MAPK1ALDH1A1 | |
| SCHEMBL10064414 | 0.86 | HMGCR (0.34) | L3MBTL1MAPK1ALDH1A1 | |
| SCHEMBL8657939 | 0.86 | L3MBTL1 (0.33) | L3MBTL1MAPK1ALDH1A1 | |
| SCHEMBL21208351 | 0.85 | L3MBTL1 (0.32) | L3MBTL1MAPK1ALDH1A1 | |
| SCHEMBL18720633 | 0.84 | POLB (0.37) | SMN1; SMN2ALDH1A1PRKCAPOLBGAA | |
| SCHEMBL19996963 | 0.84 | SMN1; SMN2 (0.36) | SMN1; SMN2ALDH1A1PRKCAPOLBGAA | |
| SCHEMBL2506102 | 0.84 | L3MBTL1 (0.37) | L3MBTL1MAPK1ALDH1A1POLB | |
| SCHEMBL14094208 | 0.84 | L3MBTL1 (0.32) | L3MBTL1MAPK1 | |
| SCHEMBL18845070 | 0.84 | L3MBTL1 (0.32) | L3MBTL1MAPK1 | |
| SCHEMBL14094236 | 0.83 | ALDH1A1 (0.32) | L3MBTL1MAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-11300877-B2 | Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent | JSR CORPORATION (JP) | 2022-04-12 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9359459-B2 | Hydrocarbon-based polymers comprising two end groups with 2-oxo-1,3-dioxolan-4-yl endings, preparation thereof and use thereof | BOSTIK SA (FR) | 2016-06-07 | — | — | US | disclosed |
| US-20150315310-A1 | Hydrocarbon-based polymers comprising two end groups with 2-oxo-1,3-dioxolan-4-yl endings, preparation thereof and use thereof | BOSTIK SA (FR) | 2015-11-05 | — | — | US | disclosed |
| EP-0983231-B1 | PREPARATION OF HYDROXY URETHANES | DU PONT (US) | 2004-11-24 | — | — | EP | disclosed |
| EP-0983231-A1 | PREPARATION OF HYDROXY URETHANES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-03-08 | — | — | EP | disclosed |
| US-5977262-A | FROM CYCLIC CARBONATES AND AMINES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-11-02 | — | — | US | disclosed |
| WO-1998050345-A1 | PREPARATION OF HYDROXY URETHANES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-11-12 | — | — | WO | disclosed |
| EP-0390777-A1 | CYCLOCARBONATE COMPOUNDS | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1990-10-10 | — | — | EP | disclosed |
| WO-1989000565-A1 | CYCLOCARBONATE COMPOUNDS | DAINIPPON INK & CHEMICALS, INC. (JP) | 1989-01-26 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11300877-B2 | Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent | RER1, RAD1, POLR1A | SMN1; SMN2 2697/4885L3MBTL1 4172/4885MAPK1 511/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.