SCHEMBL668402

SCHEMBL668402

C#Cc1ccccc1CCCC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.43
CYP3A4 P08684 2/20 0.40
CYP2D6 P10635 2/20 0.40
CYP2C9 P11712 2/20 0.40
TLR8 Q9NR97 1/20 0.38
TYR P14679 1/20 0.36
NR1H2 P55055 1/20 0.36
NR1H3 Q13133 1/20 0.36
ALOX5 P09917 1/20 0.35
PTGS2 P35354 1/20 0.35
HTR1A P08908 1/20 0.34
HSD11B1 P28845 1/20 0.34
BID P55957 1/20 0.33
BCL2L1 Q07817 1/20 0.33
MCL1 Q07820 1/20 0.33
BAK1 Q16611 1/20 0.33
THRA P10827 1/20 0.33
THRB P10828 1/20 0.33
KDM4E B2RXH2 1/20 0.33
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2774096 0.94 LIPG (0.50) LIPGTLR8NR1H2NR1H3ALOX5
SCHEMBL31529667 0.92 LIPG (0.53) LIPGCYP3A4TYRNR1H2NR1H3
SCHEMBL2350389 0.92 LIPG (0.53) LIPGCYP3A4TYRNR1H2NR1H3
SCHEMBL2152995 0.88 CYP2E1 (0.38) LIPGCYP2D6CYP2C9HTR1ACYP2C19
SCHEMBL2353501 0.85 NR1H2 (0.39) LIPGCYP3A4CYP2D6CYP2C9TLR8
SCHEMBL27932474 0.85 LIPG (0.36) LIPGCYP3A4CYP2D6CYP2C9HSD11B1
SCHEMBL217030 0.83 LIPG (0.46) LIPGCYP3A4CYP2D6CYP2C9TLR8
SCHEMBL4952215 0.83 LIPG (0.36) LIPGCYP3A4CYP2D6CYP2C9TLR8
SCHEMBL1726412 0.80 TSHR (0.45) LIPGCYP3A4CYP2D6CYP2C9TLR8
SCHEMBL2119420 0.80 CYP3A4 (0.44) LIPGCYP3A4CYP2D6CYP2C9TLR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111592607-B Application of covalent organic framework material of supported rhodium catalyst in alkyne polymerization 北京理工大学 2023-06-20 CN claimed
US-9920160-B2 Method for synthesis of polymer containing multiple epoxy groups ZHEJIANG UNIVERSITY (CN) 2018-03-20 US claimed
US-20170044304-A1 Method for synthesis of polymer containing multiple epoxy groups UNIV ZHEJIANG (CN) 2017-02-16 US claimed
CN-111592607-B Application of covalent organic framework material of supported rhodium catalyst in alkyne polymerization 北京理工大学 2023-06-20 CN disclosed
US-9920160-B2 Method for synthesis of polymer containing multiple epoxy groups ZHEJIANG UNIVERSITY (CN) 2018-03-20 US disclosed
US-20170044304-A1 Method for synthesis of polymer containing multiple epoxy groups UNIV ZHEJIANG (CN) 2017-02-16 US disclosed
CN-105295947-A Manufacturing method by contacting hydrogen reduction DAINIPPON INK & CHEMICALS 2016-02-03 CN disclosed
WO-2012024029-A1 CONTROLLING CONCENTRATIONS OF ANIONS WITH LIGHT USING ARYL-TRIAZOLE FOLDAMERS INDIANA RESEARCH & TECHNOLOGY CORPORATION (US) 2012-02-23 WO disclosed
US-20100116389-A1 CUSHION COMPOUND FOR COLD-RETREADING TYRES BRIDGESTONE CORPORATION (JP) 2010-05-13 US disclosed
US-7547562-B2 Light emitting device and method for manufacturing same SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2009-06-16 US disclosed
WO-2008125645-A1 METHOD OF COLD RETREADING TYRES BRIDGESTONE CORPORATION (JP) 2008-10-23 WO disclosed
US-7439315-B2 Polymer film and method for producing the same NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20060052560-A1 Polymer film and method for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-03-09 US disclosed
US-20050059788-A1 Supplying raw material gas containing acetylenic compound in chamber under low pressure; activation of gas in plasma generated reaction chamber, depositing on surface of semiconductor; addition polymerization; high mechanical strength SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-03-17 US disclosed
US-20030042849-A1 Light emitting device and method for manufacuturing same SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2003-03-06 US disclosed