Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGDR2 | Q9Y5Y4 | 4/20 | 0.72 |
| ▸ | POLB | P06746 | 2/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.56 |
| ▸ | MMP2 | P08253 | 1/20 | 0.56 |
| ▸ | MMP3 | P08254 | 1/20 | 0.56 |
| ▸ | MMP13 | P45452 | 1/20 | 0.56 |
| ▸ | MMP14 | P50281 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | MEN1 | O00255 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17863711 | 0.84 | PTGDR2 (0.51) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL10627483 | 0.84 | PTGDR2 (0.51) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL12967060 | 0.84 | LMNA (0.60) | PTGDR2L3MBTL1SMN1; SMN2MMP2MMP3 | |
| SCHEMBL354835 | 0.84 | PTGDR2 (1.00) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL5490504 | 0.81 | PTGDR2 (0.49) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL29682135 | 0.80 | L3MBTL1 (0.80) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL340762 | 0.80 | L3MBTL1 (0.80) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL10555350 | 0.80 | PTGDR2 (0.47) | PTGDR2POLBSMN1; SMN2MMP2MMP3 | |
| SCHEMBL2342765 | 0.79 | PTGDR2 (0.68) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA | |
| SCHEMBL8115884 | 0.79 | L3MBTL1 (0.71) | PTGDR2POLBL3MBTL1SMN1; SMN2GLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0726500-B1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2000-05-31 | — | — | EP | claimed |
| US-5731125-A | FOR FORMING RESIST FILM | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | claimed |
| EP-0901043-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6610638-B1 | Reacting acrolein with alcohols, hydrogenating in presence of catalysts and distillating to recover 3-methoxy-1-propanol, used as cleaning compounds or chemical intermediates | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-26 | — | — | US | disclosed |
| EP-0780732-B1 | Polymer composition and resist material | WAKO PURE CHEM IND LTD (JP) | 2003-07-09 | — | — | EP | disclosed |
| US-6576400-B1 | Acrylic ester polymer | TORAY INDUSTRIES, INC. (JP) | 2003-06-10 | — | — | US | disclosed |
| EP-0838727-B1 | Radiation sensitive composition | CLARIANT FINANCE BVI LTD (VG) | 2001-06-20 | — | — | EP | disclosed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |