SCHEMBL6689016

SCHEMBL6689016

C=C(C)c1ccc(OC(OCC)C(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.35
PARP10 Q53GL7 2/20 0.34
NPSR1 Q6W5P4 3/20 0.33
MAPT P10636 2/20 0.33
POLB P06746 1/20 0.33
HPGD P15428 1/20 0.32
USP2 O75604 1/20 0.32
MEN1 O00255 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
LTB4R Q15722 2/20 0.31
LTB4R2 Q9NPC1 2/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PPARG P37231 1/20 0.31
PPARA Q07869 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6691910 0.88 CYP3A4 (0.36) PPARGPPARA
SCHEMBL6689731 0.88 L3MBTL1 (0.36) KMT2APARP10NPSR1MAPTMEN1
SCHEMBL6691005 0.85 TP53 (0.40) MAPTPPARGPPARA
SCHEMBL6692463 0.84 TP53 (0.42) MAPTPPARGPPARA
SCHEMBL685750 0.83 KMT2A (0.37) KMT2APARP10NPSR1MAPTPOLB
SCHEMBL6694133 0.81 KMT2A (0.38) KMT2APARP10MAPTPOLBHPGD
SCHEMBL6689823 0.80 KMT2A (0.41) KMT2APARP10NPSR1MAPTPOLB
SCHEMBL6694160 0.79 KMT2A (0.31) KMT2APARP10MAPTPRSS1PRSS2
SCHEMBL6692061 0.79 KMT2A (0.36) KMT2APARP10MAPTPOLBMEN1
SCHEMBL685869 0.79 KMT2A (0.33) KMT2APARP10NPSR1MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed