SCHEMBL6694263

SCHEMBL6694263

C=C(C)c1ccc(OC(CCCC)OC2CCCC2)cc1

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.33
HTT P42858 1/20 0.33
HPGD P15428 5/20 0.32
SMN1; SMN2 Q16637 3/20 0.32
RAB9A P51151 2/20 0.32
NPC1 O15118 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
GAA P10253 1/20 0.31
TSHR P16473 1/20 0.30
MDM2 Q00987 1/20 0.30
KDM4E B2RXH2 1/20 0.30
ALOX12 P18054 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6691451 0.99 ALDH1A1 (0.35) ALDH1A1HTTHPGDSMN1; SMN2RAB9A
SCHEMBL6694774 0.92 SMN1; SMN2 (0.33) ALDH1A1HTTHPGDSMN1; SMN2RAB9A
SCHEMBL6689050 0.91 SMN1; SMN2 (0.35) ALDH1A1HTTHPGDSMN1; SMN2RAB9A
SCHEMBL6693617 0.87 SMN1; SMN2 (0.35) ALDH1A1HPGDSMN1; SMN2RAB9ANPC1
SCHEMBL6691344 0.86 SMN1; SMN2 (0.36) ALDH1A1HTTHPGDSMN1; SMN2RAB9A
SCHEMBL6691367 0.81 CHRNB2 (0.33) ALDH1A1KDM4E
SCHEMBL6689826 0.80 CHRNB2 (0.33) ALDH1A1MEN1KMT2AKDM4E
SCHEMBL6694117 0.80 TAS1R3 (0.33) RAB9AGAATSHR
SCHEMBL6693603 0.80 GAA (0.36) RAB9ANPC1L3MBTL1GAATSHR
SCHEMBL6689384 0.79 TAS1R3 (0.32) RAB9AL3MBTL1GAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed