SCHEMBL6694448

SCHEMBL6694448

C=C(C)c1ccc(OC(C)(CC)OCCC)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.33
PLK1 P53350 1/20 0.33
ELANE P08246 2/20 0.31
PPARG P37231 3/20 0.31
PPARA Q07869 1/20 0.31
ADRB2 P07550 1/20 0.30
ADRB1 P08588 1/20 0.30
ADRB3 P13945 1/20 0.30
HDAC3 O15379 1/20 0.30
HDAC1 Q13547 1/20 0.30
HDAC2 Q92769 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30
ADORA3 P0DMS8 1/20 0.30
PSEN1 P49768 2/20 0.30
PSEN2 P49810 2/20 0.30
APH1B Q8WW43 2/20 0.30
NCSTN Q92542 2/20 0.30
APH1A Q96BI3 2/20 0.30
PSENEN Q9NZ42 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6697849 0.94 GAA (0.36) L3MBTL1HDAC3HDAC1HDAC2MAPT
SCHEMBL6695241 0.91 TP53 (0.40) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL6691243 0.90 TP53 (0.42) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL6692063 0.90 ELANE (0.36) L3MBTL1PLK1ELANEPPARGPPARA
SCHEMBL6691449 0.88 OPRK1 (0.33) PPARAMAPTADORA3ALDH1A1
SCHEMBL6695731 0.87 HDAC3 (0.33) L3MBTL1ELANEPPARAHDAC3HDAC1
SCHEMBL6697798 0.85 GAA (0.34) ELANEHDAC3HDAC1HDAC2MAPT
SCHEMBL6691454 0.85 ELANE (0.35) ELANEHDAC3HDAC1HDAC2MAPT
SCHEMBL6689043 0.84 L3MBTL1 (0.34) L3MBTL1PLK1ELANEPPARGADRB2
SCHEMBL6693738 0.83 TP53 (0.38) ELANEMAPTPSEN1PSEN2APH1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed