SCHEMBL6689043

SCHEMBL6689043

C=C(C)c1ccc(OC(C)(C)OCCC)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.34
PLK1 P53350 1/20 0.34
ELANE P08246 1/20 0.33
PPARG P37231 2/20 0.32
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31
STS P08842 1/20 0.31
GAA P10253 1/20 0.31
RAB9A P51151 1/20 0.31
TP53 P04637 1/20 0.31
TSHR P16473 1/20 0.31
PSEN1 P49768 2/20 0.31
PSEN2 P49810 2/20 0.31
APH1B Q8WW43 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6690565 0.92 TSHR (0.36) L3MBTL1HDAC3HDAC1HDAC2MAPT
SCHEMBL6689017 0.89 TP53 (0.41) MAPTGAARAB9ATP53TSHR
SCHEMBL6694140 0.88 TP53 (0.43) MAPTGAARAB9ATP53TSHR
SCHEMBL6690485 0.87 PPARA (0.34) L3MBTL1PLK1ELANEPPARGHDAC3
SCHEMBL6689024 0.84 L3MBTL1 (0.33) L3MBTL1PLK1ELANEPPARGADRB2
SCHEMBL6694448 0.84 L3MBTL1 (0.33) L3MBTL1PLK1ELANEPPARGADRB2
SCHEMBL6692063 0.83 ELANE (0.36) L3MBTL1PLK1ELANEPPARG
SCHEMBL6694517 0.82 TAS1R3 (0.32) L3MBTL1PLK1ELANEADRB2ADRB1
SCHEMBL6695731 0.81 HDAC3 (0.33) L3MBTL1ELANEHDAC3HDAC1HDAC2
SCHEMBL6697849 0.78 GAA (0.36) L3MBTL1HDAC3HDAC1HDAC2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed