SCHEMBL6694522

SCHEMBL6694522

CC(CCCCCC(CC(=O)O)C1CC(C)(C)N(C)C(C)(C)C1)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.37
TBXAS1 P24557 2/20 0.36
ACE2 Q9BYF1 1/20 0.35
LTA4H P09960 1/20 0.34
BLM P54132 1/20 0.33
GPR84 Q9NQS5 4/20 0.33
TSHR P16473 1/20 0.32
NFKB1 P19838 1/20 0.32
CYP2C19 P33261 1/20 0.32
GABRR1 P24046 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28247100 0.86 FFAR4 (0.40) GPR84TSHRNFKB1
SCHEMBL742992 0.81 L3MBTL1 (0.38) TSHR
SCHEMBL26698391 0.81 L3MBTL1 (0.38) TSHR
Sebacic Acid SCHEMBL28259015 0.79 TSHR (0.41) TSHR
SCHEMBL28003722 0.77 FFAR4 (0.41) GPR84TSHRNFKB1
SCHEMBL27921870 0.75 TSHR (0.37) TSHR
SCHEMBL1019749 0.71 FFAR4 (0.41) TSHRNFKB1
SCHEMBL11359686 0.70 TSHR (0.41) GPR84TSHRNFKB1CYP2C19
SCHEMBL15300097 0.70 GPR84 (0.41) ACE2GPR84TSHRNFKB1CYP2C19
SCHEMBL15299924 0.70 GPR84 (0.41) ACE2GPR84TSHRNFKB1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3134250-A1 CONTINUOUS THREE DIMENSIONAL FABRICATION FROM IMMISCIBLE LIQUIDS CARBON3D, Inc. (US) 2017-03-01 EP disclosed
WO-2015164234-A1 CONTINUOUS THREE DIMENSIONAL FABRICATION FROM IMMISCIBLE LIQUIDS CARBON3D, INC. (US) 2015-10-29 WO disclosed
WO-2004065505-A1 WATER BASED PROTECTANT CONTAINING A REACTION PRODUCT OF TWO IONIC SURFACTANTS GHODOUSSI VAHID (US) 2004-08-05 WO disclosed
EP-1250378-A2 MATERIAL FOR COATINGS AND ADHESIVES BASED ON POLYMERS COMPRISING THIOETHER STRUCTURAL UNITS AND METHOD FOR PRODUCING SAID COMPOUNDS Intron Jena Gesellschaft für Digitale Farbtransfer Drucktechnik mbH (DE) 2002-10-23 EP disclosed
WO-2001042382-A2 MATERIAL FOR COATINGS AND ADHESIVES BASED ON POLYMERS COMPRISING THIOETHER STRUCTURAL UNITS AND METHOD FOR PRODUCING SAID COMPOUNDS INTRON JENA GESELLSCHAFT FÜR DIGITALE FARBTRANSFERDRUCKTECHNIK MBH (DE) 2001-06-14 WO disclosed