SCHEMBL6695243

SCHEMBL6695243

C=C(C)c1ccc(OC(CC)OC(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.39
PARP10 Q53GL7 1/20 0.38
POLB P06746 1/20 0.36
MAPT P10636 3/20 0.35
NPSR1 Q6W5P4 1/20 0.35
ALDH1A1 P00352 2/20 0.34
HTT P42858 2/20 0.34
TP53 P04637 1/20 0.34
THRB P10828 1/20 0.34
MEN1 O00255 1/20 0.31
LTB4R Q15722 2/20 0.31
LTB4R2 Q9NPC1 2/20 0.31
DRD2 P14416 1/20 0.31
DRD3 P35462 1/20 0.31
NR1H4 Q96RI1 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694609 0.88 KMT2A (0.37) KMT2APARP10POLBMAPTNPSR1
SCHEMBL6692565 0.85 KMT2A (0.35) KMT2APARP10POLBMAPTNPSR1
SCHEMBL6691138 0.85 MAPT (0.37) KMT2APARP10POLBMAPTNPSR1
SCHEMBL685869 0.82 KMT2A (0.33) KMT2APARP10POLBMAPTNPSR1
SCHEMBL6691528 0.80 KMT2A (0.43) KMT2APARP10POLBMAPTNPSR1
SCHEMBL6694754 0.79 KMT2A (0.31) KMT2APARP10MAPTNR1H4
SCHEMBL6692471 0.79 L3MBTL1 (0.33) KMT2AMAPTHTTTP53SMN1; SMN2
SCHEMBL6694149 0.79 TSHR (0.36) MAPTTP53SMN1; SMN2
SCHEMBL19886220 0.79 KMT2A (0.59) KMT2APARP10POLBMAPTNPSR1
SCHEMBL6698189 0.77 TP53 (0.41) MAPTTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed