Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | ALPL | P05186 | 1/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | ALPI | P09923 | 1/20 | 0.30 |
| ▸ | ALPG | P10696 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6690524 | 0.85 | KMT2A (0.33) | MAPTKMT2APARP10 | |
| SCHEMBL6691118 | 0.83 | KMT2A (0.39) | MAPTKMT2AMEN1PARP10ALDH1A1 | |
| SCHEMBL6694160 | 0.82 | KMT2A (0.31) | MAPTKMT2APARP10 | |
| SCHEMBL6691334 | 0.80 | ADRB2 (0.32) | — | |
| SCHEMBL6689710 | 0.80 | SLC2A1 (0.35) | — | |
| SCHEMBL23598316 | 0.80 | ACHE (0.44) | MAPTKMT2AMEN1ALDH1A1 | |
| SCHEMBL6689348 | 0.78 | KMT2A (0.41) | MAPTKMT2AMEN1PARP10ALDH1A1 | |
| SCHEMBL26452156 | 0.78 | PARP10 (0.59) | KMT2APARP10ALDH1A1 | |
| SCHEMBL6697933 | 0.77 | SMN1; SMN2 (0.35) | MAPTPARP10ALDH1A1 | |
| SCHEMBL6695729 | 0.77 | TP53 (0.39) | MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0959389-B1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |