SCHEMBL6700384

SCHEMBL6700384

Cc1ccc(/C=C/c2nc(N)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH4 Q9H3N8 6/20 0.52
DHFR P00374 1/20 0.43
NFE2L2 Q16236 2/20 0.38
MEN1 O00255 2/20 0.38
MAPT P10636 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 1/20 0.37
PTGS2 P35354 2/20 0.36
RELA Q04206 1/20 0.36
GRM4 Q14833 2/20 0.36
TUBB4A P04350 1/20 0.35
TUBB P07437 1/20 0.35
TUBA3C P0DPH7 1/20 0.35
TUBA1B P68363 1/20 0.35
TUBA4A P68366 1/20 0.35
TUBB4B P68371 1/20 0.35
TUBB3 Q13509 1/20 0.35
TUBB2A Q13885 1/20 0.35
TUBB8 Q3ZCM7 1/20 0.35
TUBA3E Q6PEY2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3037953 1.00 HRH4 (0.52) HRH4DHFRNFE2L2MEN1MAPT
SCHEMBL269262 0.90 HRH4 (0.43) HRH4DHFRNFE2L2MAPTLMNA
SCHEMBL269261 0.90 HRH4 (0.43) HRH4DHFRNFE2L2MAPTLMNA
SCHEMBL5019510 0.86 HRH4 (0.41) HRH4DHFRNFE2L2MAPTPTGS2
SCHEMBL12110095 0.86 HRH4 (0.41) HRH4DHFRNFE2L2MAPTPTGS2
SCHEMBL153282 0.84 MAPT (0.55) DHFRNFE2L2MEN1MAPTKMT2A
SCHEMBL811981 0.84 MAPT (0.55) DHFRNFE2L2MEN1MAPTKMT2A
SCHEMBL28939703 0.78 NFE2L2 (0.38) HRH4DHFRNFE2L2MAPTLMNA
SCHEMBL4920814 0.75 HRH4 (0.49) HRH4DHFRMEN1MAPTKMT2A
SCHEMBL12595128 0.75 KDM4E (0.47) HRH4MAPTPTGS2ALOX5PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040009426-A1 Photopolymerizable monomers hardenable by an infrared exposure; electrostatic capacitance rate of increased ratio of such photosensitive formulation, is no more than 0.7 FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
EP-1369231-A2 Infrared photosensitive composition and image recording material for infrared exposure FUJI PHOTO FILM CO., LTD. (JP) 2003-12-10 EP disclosed