Maleic Anhydride

Maleic Anhydride

SCHEMBL6701688

C=CC(=O)C12CC3CC(CC(O)(C3)C1)C2.O=C1C=CC(=O)O1

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.40
CNR2 P34972 1/20 0.38
ABL1 P00519 1/20 0.36
TSHR P16473 1/20 0.36
RIN1 Q13671 1/20 0.36
KDM4E B2RXH2 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
ALDH1A1 P00352 4/20 0.34
NPC1 O15118 3/20 0.34
RAB9A P51151 3/20 0.34
L3MBTL1 Q9Y468 3/20 0.33
P2RX7 Q99572 1/20 0.33
USP2 O75604 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
POLB P06746 1/20 0.32
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5406288 0.85 HSD11B1 (0.50) HSD11B1CNR2ABL1TSHRRIN1
SCHEMBL12855161 0.71 HSD11B1 (0.51) HSD11B1CNR2ABL1TSHRRIN1
SCHEMBL5413875 0.70 PKM (0.46) HSD11B1SMN1; SMN2ALDH1A1L3MBTL1NPSR1
SCHEMBL26229888 0.68 TSHR (0.42) TSHRSMN1; SMN2ALDH1A1NPSR1
SCHEMBL418510 0.68 HSD11B1 (0.42) HSD11B1KDM4ESMN1; SMN2ALDH1A1L3MBTL1
Acrylic Acid SCHEMBL5146097 0.67 PKM (0.45) HSD11B1ALDH1A1NPC1RAB9APOLB
SCHEMBL27763496 0.67 HSD11B1 (0.58) HSD11B1CNR2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL28413574 0.66 ALDH1A1 (0.49) HSD11B1CNR2ABL1TSHRRIN1
SCHEMBL23780828 0.65 HSD11B1 (0.56) HSD11B1CNR2ABL1TSHRRIN1
SCHEMBL3188989 0.65 HSD11B1 (0.56) HSD11B1CNR2KDM4ESMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040043324-A1 Resin useful for resist, resist composition and pattern forming process using the same KABUSHIKI KAISHA TOSHIBA (JP) 2004-03-04 US disclosed
US-20020098441-A1 Resin useful for resist, resist composition and pattern forming process using the same KABUSHIKI KAISHA TOSHIBA (JP) 2002-07-25 US disclosed