⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6703632 | 0.84 | DNM1 (0.35) | — | |
| SCHEMBL6705280 | 0.82 | OPRM1 (0.37) | — | |
| SCHEMBL18691358 | 0.80 | ZDHHC7 (0.38) | — | |
| SCHEMBL18691419 | 0.80 | ZDHHC7 (0.38) | — | |
| SCHEMBL3222075 | 0.80 | ZDHHC7 (0.38) | — | |
| SCHEMBL3793379 | 0.80 | ZDHHC7 (0.38) | — | |
| SCHEMBL6547485 | 0.76 | — | — | |
| SCHEMBL558058 | 0.74 | — | — | |
| SCHEMBL3693727 | 0.74 | — | — | |
| SCHEMBL9693497 | 0.69 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240158904-A1 | UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF | TOAGOSEI CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| EP-4289618-A1 | UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME | Toagosei Co., Ltd. (JP) | 2023-12-13 | — | — | EP | disclosed |
| CN-116897195-A | Primer composition for inorganic substance layer lamination, cured product thereof, and method for producing same | 东亚合成株式会社 | 2023-10-17 | — | — | CN | disclosed |
| WO-2022168804-A1 | UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME | 東亞合成株式会社 | 2022-08-11 | — | — | WO | disclosed |
| US-11028270-B2 | Black matrix composition, black matrix, and black matrix production method | MERCK PATENT GMBH (DE) | 2021-06-08 | — | — | US | disclosed |
| US-20200277494-A1 | BLACK MATRIX COMPOSITION, BLCK MATRIX, AND BLACK MATRIX PRODUCTION METHOD | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2020-09-03 | — | — | US | disclosed |
| US-10106428-B2 | Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-10-23 | — | — | US | disclosed |
| US-20170190586-A1 | METHOD FOR PRODUCING SURFACE-MODIFIED SILICA NANOPARTICLES, AND SURFACE-MODIFIED SILICA NANOPARTICLES | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-07-06 | — | — | US | disclosed |
| US-20040076593-A1 | Composition containing a modified nitrocellulose | L'OREAL (FR) | 2004-04-22 | — | — | US | disclosed |
| EP-1342731-A1 | Cosmetic composition, especially nail enamel, comprising a modified nitrocellulose | L'OREAL (FR) | 2003-09-10 | — | — | EP | disclosed |