SCHEMBL6708331

SCHEMBL6708331

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6707476 0.82 CA2 (0.37)
SCHEMBL776303 0.78 ALDH1A1 (0.31) ALDH1A1TSHR
Perflubutane SCHEMBL7058920 0.78 TSHR (0.38) ALDH1A1TSHR
SCHEMBL98173 0.72 TSHR (0.41) ALDH1A1TSHR
SCHEMBL775604 0.71 NR1H2 (0.32) ALDH1A1TSHR
Bromide SCHEMBL5145219 0.70 NR1H2 (0.33) ALDH1A1TSHR
SCHEMBL2437783 0.67 TSHR (0.41) ALDH1A1TSHR
SCHEMBL5405485 0.67 ACHE (0.37) ALDH1A1TSHR
SCHEMBL1060855 0.67 ALDH1A1 (0.36) ALDH1A1TSHR
SCHEMBL776744 0.65 ALDH1A1 (0.35) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040106062-A1 Photoacid generators in photoresist compositions for microlithography E. I. DU PONT DE NEMOURS AND COMPANY 2004-06-03 US claimed
EP-1332406-A2 PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E. I. du Pont de Nemours and Company (US) 2003-08-06 EP claimed
WO-2002039186-A2 PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E. I. DU PONT DE NEMOURS AND COMPANY (US) 2002-05-16 WO claimed