SCHEMBL6709895

SCHEMBL6709895

CCCCCCCCC([SiH2]OC(C)C)[SiH2]OC(C)C

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.39
SPHK1 Q9NYA1 1/20 0.38
LMNA P02545 3/20 0.37
DNM1 Q05193 2/20 0.36
ADH1B P00325 1/20 0.35
ADH1C P00326 1/20 0.35
ADH1A P07327 1/20 0.35
ADH4 P08319 1/20 0.35
ADH7 P40394 1/20 0.35
TSHR P16473 1/20 0.35
THRB P10828 1/20 0.35
SMPD1 P17405 3/20 0.34
ACE2 Q9BYF1 1/20 0.34
GPR84 Q9NQS5 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6708355 1.00 OPRM1 (0.39) OPRM1SPHK1LMNADNM1ADH1B
SCHEMBL6706863 1.00 OPRM1 (0.39) OPRM1SPHK1LMNADNM1ADH1B
SCHEMBL6707422 1.00 OPRM1 (0.39) OPRM1SPHK1LMNADNM1ADH1B
SCHEMBL6708524 0.98 OPRM1 (0.41) OPRM1SPHK1LMNADNM1ADH1B
SCHEMBL705232 0.73 DNM1 (0.33) OPRM1DNM1
SCHEMBL6706825 0.72 SMPD1 (0.37) OPRM1LMNADNM1TSHRTHRB
SCHEMBL6708438 0.72 SMPD1 (0.37) OPRM1LMNADNM1TSHRTHRB
SCHEMBL6708451 0.72 SMPD1 (0.37) OPRM1LMNADNM1TSHRTHRB
SCHEMBL1123114 0.72 SMPD1 (0.37) OPRM1LMNADNM1TSHRTHRB
SCHEMBL1123109 0.70 OPRM1 (0.34) OPRM1LMNADNM1SMPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040028978-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-12 US disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed