SCHEMBL6720988

SCHEMBL6720988

CC(OC(=O)C(C)(C)N=NC(C)(C)C(=O)OC(C)c1ccc2c(c1)C(=O)c1ccccc1-2)c1ccc2c(c1)C(=O)c1ccccc1-2

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 6/20 0.41
▸ RAB9A P51151 5/20 0.41
▸ ALDH1A1 P00352 3/20 0.41
▸ CASP3 P42574 2/20 0.41
▸ SENP8 Q96LD8 2/20 0.41
▸ SENP7 Q9BQF6 2/20 0.41
▸ SENP6 Q9GZR1 2/20 0.41
▸ PLA2G1B P04054 1/20 0.41
▸ NFKB1 P19838 1/20 0.41
▸ NFKB2 Q00653 1/20 0.41
▸ RELA Q04206 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ ATG4B Q9Y4P1 1/20 0.41
▸ PTPRC P08575 4/20 0.40
▸ LCK P06239 1/20 0.40
▸ CTSL P07711 1/20 0.40
▸ PTPN2 P17706 1/20 0.40
▸ PTPN1 P18031 1/20 0.40
▸ CTSS P25774 1/20 0.40
▸ PTPN13 Q12923 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16300502 0.88 PTPRC (0.46) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL6721047 0.85 NPC1 (0.42) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL28857883 0.80 ALDH1A1 (0.49) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL28857884 0.79 TTR (0.49) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL18253130 0.75 KEAP1 (0.44) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL19871338 0.73 TTR (0.40) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL17509950 0.73 ALDH1A1 (0.41) NPC1RAB9AALDH1A1L3MBTL1ATM
SCHEMBL18933807 0.72 ELANE (0.50) NPC1RAB9AALDH1A1CASP3SENP8
SCHEMBL18412611 0.70 FAAH (0.45) NPC1RAB9AALDH1A1SMN1; SMN2MEN1
SCHEMBL12269081 0.70 ALDH1A1 (0.53) NPC1RAB9AALDH1A1L3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 — — US disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 — — US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 — — US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 — — US disclosed
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