SCHEMBL6721069

SCHEMBL6721069

CC(C)(C)ON(C(C)(C)C)C(C)(C)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 2/20 0.39
CYP2C9 P11712 1/20 0.35
PTPN5 P54829 1/20 0.33
AKT1 P31749 1/20 0.33
AKT2 P31751 1/20 0.33
RXRA P19793 1/20 0.33
RXRB P28702 1/20 0.33
TAAR1 Q96RJ0 1/20 0.32
MAPK1 P28482 1/20 0.32
ALDH1A1 P00352 2/20 0.32
CYP19A1 P11511 1/20 0.31
LSS P48449 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16300506 0.84 KIF11 (0.41) KIF11CYP2C9PTPN5AKT1AKT2
SCHEMBL6721010 0.73 KIF11 (0.45) KIF11CYP2C9PTPN5AKT1AKT2
SCHEMBL9245412 0.72 KIF11 (0.48) KIF11CYP2C9PTPN5AKT1AKT2
SCHEMBL16300532 0.72 KIF11 (0.43) KIF11CYP2C9PTPN5AKT1AKT2
SCHEMBL6721117 0.68 CYP17A1 (0.36) KIF11AKT1AKT2ALDH1A1
SCHEMBL3421942 0.67 KIF11 (0.59) KIF11CYP2C9PTPN5RXRARXRB
SCHEMBL15832876 0.67 ALDH1A1 (0.58) KIF11CYP2C9PTPN5AKT1AKT2
SCHEMBL128222 0.67 KIF11 (0.59) KIF11CYP2C9PTPN5RXRARXRB
SCHEMBL24206102 0.67 KIF11 (0.46) KIF11CYP2C9RXRARXRBCYP19A1
SCHEMBL18352212 0.67 KIF11 (0.46) KIF11CYP2C9RXRARXRBCYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed