Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIA1 | P42261 | 1/20 | 0.48 |
| ▸ | GRIA2 | P42262 | 1/20 | 0.48 |
| ▸ | GRIA3 | P42263 | 1/20 | 0.48 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.48 |
| ▸ | PDE4A | P27815 | 1/20 | 0.46 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.46 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.46 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | CASP6 | P55212 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.36 |
| ▸ | SHBG | P04278 | 1/20 | 0.36 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.31 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13608937 | 0.83 | GRIA1 (0.44) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL28448063 | 0.83 | GRIA1 (0.44) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL2513816 | 0.81 | MEN1 (0.43) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL1525264 | 0.78 | APOBEC3G (0.36) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL1145825 | 0.78 | KLF10 (0.44) | GRIA1GRIA2GRIA3GRIA4KDM4E | |
| SCHEMBL12201590 | 0.78 | KDM4E (0.48) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL650981 | 0.78 | GRIA1 (0.40) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL28415799 | 0.78 | GRIA1 (0.40) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL235163 | 0.78 | SHBG (0.46) | GRIA1GRIA2GRIA3GRIA4PDE4A | |
| SCHEMBL20687201 | 0.78 | GRIA1 (0.40) | GRIA1GRIA2GRIA3GRIA4PDE4A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1806618-B1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORP (JP) | 2010-06-09 | — | — | EP | claimed |
| CN-116589390-A | Polythiols compound and application thereof | 中国科学院长春应用化学研究所 | 2023-08-15 | — | — | CN | disclosed |
| US-11028323-B2 | Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-08 | — | — | US | disclosed |
| US-10921650-B2 | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20200230571-A1 | MESOPOROUS SILICA AND STATIONARY PHASES AND SOLID PHASE SORBENTS THEREFROM | THE FLORIDA INTERNATIONAL UNIVERSITY BOARD OF TRUSTEES (US) | 2020-07-23 | — | — | US | disclosed |
| US-10590304-B2 | Radiation curable aqueous dispersions | ALLNEX BELGIUM S.A. (BE) | 2020-03-17 | — | — | US | disclosed |
| US-20200041898-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-20190094689-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-6310161-B1 | ACRYLATE WITH MONOTHIOL AND CONJUGATED AROMATIC COMPOUND | UCB S.A. (BE) | 2001-10-30 | — | — | US | disclosed |
| EP-0810992-B1 | SULFUR-CONTAINING COMPOUNDS FOR OPTICAL GRADE POLYMERIC CASTING COMPOSITIONS | UCB SA (BE) | 2001-06-13 | — | — | EP | disclosed |
| US-6051733-A | Sulfur-containing compounds for optical grade polymeric casting compositions | UCB, S.A. (BE) | 2000-04-18 | — | — | US | disclosed |
| EP-0810992-A1 | SULFUR-CONTAINING COMPOUNDS FOR OPTICAL GRADE POLYMERIC CASTING COMPOSITIONS | U C B, S.A. (BE) | 1997-12-10 | — | — | EP | disclosed |
| US-5561216-A | PROVIDES CONTROLLED MOLECULAR WEIGHT AND NARROW MOLECULAR WEIGHT DISTRIBUTION | UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) | 1996-10-01 | — | — | US | disclosed |
| WO-1996026184-A1 | SULFUR-CONTAINING COMPOUNDS FOR OPTICAL GRADE POLYMERIC CASTING COMPOSITIONS | UCB, S.A. (BE) | 1996-08-29 | — | — | WO | disclosed |
| US-4806448-A | PHOTORESISTS | CIBA-GEIGY CORPORATION (US) | 1989-02-21 | — | — | US | disclosed |
| US-4737426-A | POSITIVE IMAGES FOR PRINTING PLATES; PRINTED CIRCUITS, INTEGRATED CIRCUITS, AND PHOTOGRAPHIC FILMS | CIBA-GEIGY CORPORATION (US) | 1988-04-12 | — | — | US | disclosed |
| EP-0202196-A2 | Cyclic acetals or ketals of beta-ketoesters or amides | CIBA-GEIGY AG (CH) | 1986-11-20 | — | — | EP | disclosed |
| US-4080364-A | Stabilization of polyolefins against degradative deterioration as a result of exposure to light and air at elevated temperatures | ARGUS CHEMICAL CORPORATION (US) | 1978-03-21 | — | — | US | disclosed |