Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6728026 | 0.85 | CA1 (0.30) | CA1CA2 | |
| SCHEMBL6725965 | 0.84 | CA2 (0.32) | CA1CA2 | |
| SCHEMBL6727726 | 0.71 | CYP2D6 (0.37) | MAPT | |
| Hydrogen Sulfide SCHEMBL3629966 | 0.68 | MAPT (0.37) | MAPTCA1CA2CA4 | |
| Methylsulfanylmethane SCHEMBL15329055 | 0.65 | CA1 (0.36) | MAPTCA1CA2CA4 | |
| SCHEMBL3146166 | 0.65 | MAPT (0.34) | MAPTCA1CA2CA4 | |
| SCHEMBL515933 | 0.64 | MAPT (0.43) | MAPTCA1CA2CA4 | |
| Hydrogen Sulfide SCHEMBL9081553 | 0.63 | PTGS1 (0.33) | MAPT | |
| SCHEMBL642592 | 0.62 | MAPT (0.41) | MAPTCA1CA2CA4 | |
| SCHEMBL5866310 | 0.62 | KDM4E (0.34) | MAPTCA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |