Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL439923 | 0.74 | LMNA (0.33) | LMNACYP2C9 | |
| SCHEMBL1440898 | 0.70 | LMNA (0.31) | LMNACYP2C9 | |
| SCHEMBL1331203 | 0.69 | — | — | |
| SCHEMBL14113510 | 0.67 | LMNA (0.37) | LMNA | |
| SCHEMBL13588297 | 0.65 | ALDH1A1 (0.33) | LMNACYP2C9 | |
| SCHEMBL11265884 | 0.64 | — | — | |
| SCHEMBL10432409 | 0.63 | LMNA (0.33) | LMNACYP2C9 | |
| SCHEMBL21944471 | 0.63 | — | — | |
| SCHEMBL11407604 | 0.63 | LMNA (0.54) | LMNACYP2C9 | |
| SCHEMBL16254604 | 0.63 | LMNA (0.38) | LMNACYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2296040-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-6806335-B2 | FOR USE IN FINE PATTERNING OF SEMICONDUCTORS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-19 | — | — | US | disclosed |
| US-6692889-B1 | COPOLYMERS CONTAINING DERIVATIZED ADAMANTANYL ACRYLATE FUNCTIONALITY; ETCHING RESISTANCE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20040006189-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. | 2004-01-08 | — | — | US | disclosed |
| US-6552143-B2 | Addition polymer including units of 1-oxo-perhydro-5,6-didehydro-4,7-methanoisobenzofuran; making a semiconductor using the photoresist; high adhesion, fine patterns | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-04-22 | — | — | US | disclosed |
| US-20020169266-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-14 | — | — | US | disclosed |
| US-6440636-B1 | HIGH ETCHING RESISTANCE, TRANSPARENCY, ALKALI SOLUBILITY, AND ADHESION; ACRYLIC ESTERS HAVING ADAMANTANE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-27 | — | — | US | disclosed |
| EP-1172694-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1172384-A1 | POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |