Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2268783 | 0.74 | ACHE (0.32) | LMNACYP2C9 | |
| SCHEMBL1440898 | 0.74 | LMNA (0.31) | LMNACYP2C9 | |
| SCHEMBL6744181 | 0.74 | LMNA (0.40) | LMNACYP2C9 | |
| SCHEMBL1331203 | 0.73 | — | — | |
| SCHEMBL7918298 | 0.71 | — | — | |
| SCHEMBL12194075 | 0.70 | — | — | |
| SCHEMBL14113510 | 0.70 | LMNA (0.37) | LMNA | |
| SCHEMBL15304338 | 0.70 | LMNA (0.41) | LMNA | |
| SCHEMBL13588297 | 0.69 | ALDH1A1 (0.33) | LMNACYP2C9 | |
| SCHEMBL11265884 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | CENTRAL GLASS CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| US-20170233405-A1 | MAX BINDERS AS MYC MODULATORS AND USES THEREOF | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2017-08-17 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| WO-2010044372-A1 | FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2010-04-22 | — | — | WO | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| EP-1795963-A1 | Positive resist composition and pattern forming method using the same | Fujifilm Corporation (JP) | 2007-06-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | PPARG, PPARA, PPARD | LMNA 901/4885CYP2C9 600/4885 |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | LMNA 2184/4885CYP2C9 2615/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | LMNA 2898/4885CYP2C9 4199/4885 |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | RER1, SMARCC1, SMCHD1 | LMNA 2834/4885CYP2C9 4369/4885 |
| US-20170233405-A1 | MAX BINDERS AS MYC MODULATORS AND USES THEREOF | MYC, MYCBP, MYCBP2 | LMNA 2047/4885CYP2C9 3926/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.