SCHEMBL6744698

SCHEMBL6744698

C=C(C(=O)OC(C)(C)C)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
TSHR P16473 1/20 0.31
HRH3 Q9Y5N1 1/20 0.31
CA12 O43570 1/20 0.31
CA14 Q9ULX7 1/20 0.31
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11687587 0.86 CA1 (0.32) DGAT1CA1CA2CA7
SCHEMBL541982 0.84 TP53 (0.38) DGAT1CA1CA2CA7TSHR
SCHEMBL4209325 0.82 CA1 (0.32) DGAT1CA1CA2CA7CYP2D6
SCHEMBL9362822 0.82 CYP2D6 (0.32) DGAT1CA1CA2CA7CYP2D6
SCHEMBL27982246 0.80 CA1 (0.31) DGAT1CA1CA2CA7
SCHEMBL7696488 0.79 DGAT1 (0.32) DGAT1
SCHEMBL8018424 0.79
SCHEMBL28117660 0.77
SCHEMBL23094033 0.76 LMNA (0.34) DGAT1
SCHEMBL1089194 0.75 DGAT1 (0.36) DGAT1CA1CA2CA7TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8003294-B2 disulfoneamines as acid generators capable of generating an acid upon irradiation with actinic ray or radiation; use in making semiconductors, printed circuits; improve Post Exposure Bake temperature dependency and exposure latitude FUJIFILM CORPORATION (JP) 2011-08-23 US disclosed
US-7611820-B2 Positive resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2009-11-03 US disclosed
US-20090123880-A1 PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-05-14 US disclosed
US-7482112-B2 Pattern forming method FUJIFILM CORPORATION (JP) 2009-01-27 US disclosed
CN-100451058-C Polyethylene crosslinkable composition UNION CARBIDE CHEM PLASTIC (US) 2009-01-14 CN disclosed
US-20080220371-A1 PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-09-11 US disclosed
US-20070172768-A1 Pattern forming method FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-20070059639-A1 Positive resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
CN-1215091-C Osmium oxide supported on hydrophilic polymer carrier WAKO PURE CHEM IND LTD (JP) 2005-08-17 CN disclosed
CN-1553932-A Polyethylene crosslinkable composition ����̼����ѧ�����ϼ�����˾ 2004-12-08 CN disclosed
CN-1494456-A Osmium oxide supported on hydrophilic polymer carrier 和光纯药工业株式会社 2004-05-05 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080220371-A1 PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION RARA, RARB, RARG DGAT1 2319/4885CA1 755/4885CA2 1865/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.