Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | LTA4H | P09960 | 2/20 | 0.41 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.40 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | PPARG | P37231 | 5/20 | 0.39 |
| ▸ | PPARA | Q07869 | 5/20 | 0.39 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.37 |
| ▸ | CA5A | P35218 | 1/20 | 0.37 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29208313 | 0.87 | CA4 (0.41) | ALDH1A1RECQLLTA4HMTNR1AMTNR1B | |
| Acrylic Acid SCHEMBL29368977 | 0.84 | THRB (0.44) | ALDH1A1MTNR1AMTNR1BLMNAPPARG | |
| SCHEMBL6040933 | 0.83 | LTA4H (0.38) | ALDH1A1RECQLLTA4HMTNR1AMTNR1B | |
| SCHEMBL1412775 | 0.83 | ALDH1A1 (0.50) | ALDH1A1RECQLLTA4HMTNR1AMTNR1B | |
| Fluorene SCHEMBL22501634 | 0.83 | SRD5A2 (0.40) | ALDH1A1RECQLLMNAPPARGPPARA | |
| SCHEMBL11147758 | 0.83 | TDP1 (0.41) | ALDH1A1RECQLPPARGPPARA | |
| SCHEMBL28325653 | 0.82 | PPARG (0.36) | ALDH1A1RECQLLTA4HMTNR1AMTNR1B | |
| SCHEMBL6574317 | 0.82 | PPARG (0.42) | LTA4HLMNATSHRPPARGPPARA | |
| SCHEMBL6438883 | 0.81 | ALDH1A1 (0.46) | ALDH1A1RECQLLTA4HMTNR1AMTNR1B | |
| SCHEMBL26970378 | 0.80 | TSHR (0.42) | ALDH1A1RECQLLMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115298244-B | Polyester, film, adhesive composition, adhesive sheet, laminate, and printed wiring board | 东洋纺MC株式会社 | 2024-10-11 | — | — | CN | claimed |
| CN-113730301-A | Deep-cleaning makeup removal mousse | 江苏苏美国际时尚管理有限公司 | 2021-12-03 | — | — | CN | claimed |
| CN-120004491-A | Preparation method of quartz glass with complex structure | 北京工业大学 | 2025-05-16 | — | — | CN | disclosed |
| CN-119790082-A | Curable composition and composite material | 日东电工株式会社 | 2025-04-08 | — | — | CN | disclosed |
| CN-115996931-B | Cyclic diol compound, process for producing the compound, and use of the compound | 新日本理化株式会社 | 2025-04-01 | — | — | CN | disclosed |
| CN-114616228-B | Compound, polymerizable composition, polymer, hologram recording medium, optical material, and optical member | 三菱化学株式会社 | 2024-12-20 | — | — | CN | disclosed |
| CN-118974139-A | Thermoplastic resin and optical lens comprising the same | 三菱瓦斯化学株式会社 | 2024-11-15 | — | — | CN | disclosed |
| CN-118382822-A | Optical lens comprising thermoplastic resin | 三菱瓦斯化学株式会社 | 2024-07-23 | — | — | CN | disclosed |
| CN-110099966-B | Colorant composition, colorant dispersion liquid, photosensitive resin composition, color filter and liquid crystal display device | 株式会社LG化学 | 2024-05-07 | — | — | CN | disclosed |
| CN-114555749-B | Adhesive composition for flexible printed circuit board, adhesive for flexible printed circuit board, and flexible printed circuit board | 三菱化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111527075-B | Xanthene compound, photosensitive resin composition containing same, photosensitive material, color filter, and display device | 株式会社LG化学 | 2024-03-15 | — | — | CN | disclosed |
| US-20080038646-A1 | Resin particle dispersion liquid, toner for developing electrostatic image and method for producing the same, developer for developing electrostatic image, and method for forming image | FUJI XEROX CO., LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070106053-A1 | Polyester, moldings thereof, and process for production of the polyester | KANEBO, LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070009777-A1 | Membrane electrode complex and solid type fuel cell using it | TORAY INDUSTRIES, INC. (JP) | 2007-01-11 | — | — | US | disclosed |
| US-7101650-B2 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-09-05 | — | — | US | disclosed |
| EP-1624514-A1 | MEMBRANE ELECTRODE COMPLEX AND SOLID POLYMER TYPE FUEL CELL USING IT | TORAY INDUSTRIES, INC. (JP) | 2006-02-08 | — | — | EP | disclosed |
| EP-1619735-A1 | POLYMER ELECTROLYTE MATERIAL, POLYMER ELECTROLYTE PART, MEMBRANE ELECTRODE COMPOSITE AND POLYMER ELECTROLYTE TYPE FUEL CELL | TORAY INDUSTRIES, INC. (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | disclosed |
| US-20040137334-A1 | Volume hologram recording photosensitive composition, volume hologram recording photosensitive medium and volume hologram | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-07-15 | — | — | US | disclosed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | disclosed |