⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL6757388 | 0.84 | LMNA (0.30) | — | |
| Methacrylic Acid SCHEMBL5025002 | 0.76 | — | — | |
| SCHEMBL7611378 | 0.70 | ALDH1A1 (0.31) | — | |
| Methacrylic Acid SCHEMBL10884526 | 0.65 | TDP1 (0.33) | — | |
| SCHEMBL17222847 | 0.63 | — | — | |
| Methacrylic Acid SCHEMBL31078449 | 0.62 | — | — | |
| SCHEMBL28882397 | 0.61 | — | — | |
| SCHEMBL11970100 | 0.60 | — | — | |
| Methacrylic Acid SCHEMBL1021695 | 0.59 | TDP1 (0.50) | — | |
| Methacrylic Acid SCHEMBL72722 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6723485-B1 | HEXAFLUOROISOPROPYL (METH)ACRYLATE RESIN AND PHOTOACID GENERATOR; LASER HAVING WAVELENGTH IN VACUUM ULTRAVIOLET REGION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-04-20 | — | — | US | disclosed |
| EP-1103856-A1 | Positive resist composition & process for forming resist pattern using same | Central Glass Company, Limited (JP) | 2001-05-30 | — | — | EP | disclosed |