SCHEMBL8636736

SCHEMBL8636736

COc1ccc(OS(=O)(=O)C(F)(F)F)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.46
EP300 Q09472 1/20 0.44
KAT8 Q9H7Z6 1/20 0.44
CDC25B P30305 2/20 0.43
ALDH1A1 P00352 1/20 0.42
IMPDH2 P12268 1/20 0.42
IMPDH1 P20839 1/20 0.42
FABP4 P15090 6/20 0.42
PLK1 P53350 1/20 0.41
NPC1 O15118 1/20 0.41
SLC2A1 P11166 1/20 0.41
HPGDS O60760 1/20 0.41
NQO1 P15559 1/20 0.40
CYP2C9 P11712 1/20 0.40
HIF1A Q16665 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12476299 0.93 MEN1 (0.41)
SCHEMBL6851155 0.91 MEN1 (0.38) SLC2A1
Tetrahydrothiophene SCHEMBL23420978 0.89 ALDH1A1 (0.39) IDO1EP300KAT8CDC25BALDH1A1
SCHEMBL9470141 0.86 GPR3 (0.37) FABP4
SCHEMBL6938489 0.85 CYP1A2 (0.43) FABP4SLC2A1
SCHEMBL8725902 0.84 MAPT (0.42) ALDH1A1
SCHEMBL29414143 0.84 CA1 (0.50) ALDH1A1
SCHEMBL5599606 0.84 CA1 (0.50) ALDH1A1
SCHEMBL29706003 0.83 MEN1 (0.42)
SCHEMBL203899 0.83 MEN1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7348071-B2 Complex fluorene-containing compounds and use EASTMAN KODAK COMPANY (US) 2008-03-25 US disclosed
US-7285341-B2 Complex fluorene-containing compounds for use in OLED devices EASTMAN KODAK COMPANY (US) 2007-10-23 US disclosed
EP-0497342-B1 Negative photoresist composition SUMITOMO CHEMICAL CO (JP) 1998-08-05 EP disclosed
US-5304456-A Negative photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-04-19 US disclosed
EP-0497342-A2 Negative photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-08-05 EP disclosed