SCHEMBL676940

SCHEMBL676940

CC(C)Oc1c[c]ccc1OC(C)C

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
ACHE P22303 1/20 0.35
IRAK4 Q9NWZ3 2/20 0.33
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32
ADRA2C P18825 1/20 0.32
NISCH Q9Y2I1 1/20 0.32
CSNK2A1 P68400 2/20 0.32
NPSR1 Q6W5P4 1/20 0.31
TLR8 Q9NR97 1/20 0.31
MCHR1 Q99705 1/20 0.31
KDM4E B2RXH2 2/20 0.30
LMNA P02545 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
CYP1A2 P05177 1/20 0.30
MAPT P10636 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL542567 0.90 NPSR1 (0.35) ALDH1A1ACHEIRAK4NPSR1LMNA
SCHEMBL316596 0.90 CA12 (0.36) ALDH1A1ACHEIRAK4NPSR1MAPT
SCHEMBL3463523 0.85 ADRA2A (0.33) ALDH1A1ACHEADRA2AADRA2BADRA2C
SCHEMBL25438757 0.84 IRAK4 (0.32) ALDH1A1ACHEIRAK4CSNK2A1TLR8
SCHEMBL3013417 0.83 KCNK3 (0.38)
SCHEMBL3082364 0.83
SCHEMBL1476996 0.83 IRAK4 (0.32) ALDH1A1ACHEIRAK4CSNK2A1
SCHEMBL1230716 0.83 IRAK4 (0.32) ALDH1A1ACHEIRAK4ADRA2AADRA2B
SCHEMBL29150351 0.82 NTRK1 (0.41) ALDH1A1IRAK4NPSR1LMNA
SCHEMBL446382 0.81 CSNK2A1 (0.40) IRAK4CSNK2A1MCHR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7811637-B2 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film TOAGOSEI CO., LTD. (JP) 2010-10-12 US claimed
US-4716168-A STIMULANTS OF IMMUNE RESPONSE NORWICH EATON PHARMACEUTICALS, INC. (US) 1987-12-29 US claimed
EP-0187705-A2 Imidazo(4,5-f)quinolines useful as immunomodulating agents Norwich Eaton Pharmaceuticals, Inc. (US) 1986-07-16 EP claimed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
EP-3018118-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD Wako Pure Chemical Industries, Ltd. (JP) 2016-05-11 EP disclosed
US-20160122292-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2016-05-05 US disclosed
CN-105339340-A Base generator, base-reactive composition containing said base generator, and base generation method WAKO PURE CHEM IND LTD 2016-02-17 CN disclosed
US-9235117-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-01-12 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
CN-102816130-B Thiazole compound and use thereof OTSUKA PHARMA CO LTD 2015-05-06 CN disclosed
EP-1367439-A1 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-12-03 EP disclosed
WO-2003097609-A1 N-SUBSTITUTED TRICYCLIC 3-AMINOPYRAZOLES AS PDFG RECEPTOR INHIBITORS JANSSEN PHARMACEUTICA N.V. (BE) 2003-11-27 WO disclosed
US-6630280-B1 Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness FUJI PHOTO FILM CO., LTD. (JP) 2003-10-07 US disclosed
US-20030108811-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-06-12 US disclosed
US-20020012866-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
US-6207343-B1 RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION FUJI PHOTO FILM CO., LTD. (JP) 2001-03-27 US disclosed
US-5506256-A PREVENTION AND/OR TREATMENT OF DEMENTIA, AMNESIA YOSHITOMI PHARMACEUTICAL INDUSTRIES, LTD. (JP) 1996-04-09 US disclosed
US-4716168-A STIMULANTS OF IMMUNE RESPONSE NORWICH EATON PHARMACEUTICALS, INC. (US) 1987-12-29 US disclosed
EP-0187705-A2 Imidazo(4,5-f)quinolines useful as immunomodulating agents Norwich Eaton Pharmaceuticals, Inc. (US) 1986-07-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method HPRT1, GNG2, BLM ALDH1A1 1468/4885ACHE 4507/4885IRAK4 4255/4885
US-20160122292-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD GNG2, EPHX2, ARHGEF1 ALDH1A1 483/4885ACHE 3801/4885IRAK4 3772/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.