Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | PARL | Q9H300 | 1/20 | 0.35 |
| ▸ | HTR6 | P50406 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | PTPN2 | P17706 | 2/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.34 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.34 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL137133 | 0.83 | HTR6 (0.48) | TDP1ALDH1A1TSHRMAPTSMN1; SMN2 | |
| SCHEMBL1143736 | 0.77 | TDP1 (0.61) | TDP1ALDH1A1TSHRMAPTNPC1 | |
| SCHEMBL26317184 | 0.77 | TDP1 (0.51) | TDP1ALDH1A1TSHRMAPTNPC1 | |
| SCHEMBL2964106 | 0.77 | VDR (0.49) | TDP1ALDH1A1SMN1; SMN2KDM4EHPGD | |
| SCHEMBL5165470 | 0.77 | TDP1 (0.59) | TDP1ALDH1A1KDM4EKMT2APTGS2 | |
| SCHEMBL2955938 | 0.77 | VDR (0.49) | TDP1ALDH1A1SMN1; SMN2KDM4EHPGD | |
| SCHEMBL9815798 | 0.77 | TDP1 (0.57) | TDP1ALDH1A1TSHRMAPTNPC1 | |
| SCHEMBL3144536 | 0.77 | VDR (0.49) | TDP1ALDH1A1SMN1; SMN2KDM4EHPGD | |
| SCHEMBL2962485 | 0.77 | VDR (0.49) | TDP1ALDH1A1SMN1; SMN2KDM4EHPGD | |
| SCHEMBL15676270 | 0.77 | ESR1 (0.46) | TDP1TSHRSMN1; SMN2PARLHTR6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223204-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | FUJITSU CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20140127627-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME | ITO TAKAYUKI (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8361693-B2 | Chemically amplified positive photoresist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| US-8329379-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2012-12-11 | — | — | US | disclosed |
| EP-2264525-B1 | Chemically amplified positive photoresist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-20120100481-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2011013842-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | WO | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-2264525-A2 | Chemically amplified positive photoresist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-20100316955-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100248143-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |