SCHEMBL3144536

SCHEMBL3144536

Cc1ccc(S(OS(=O)(=O)c2ccc(C)cc2)(c2ccccc2)c2ccc(C)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
VDR P11473 1/20 0.49
HTT P42858 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
GAA P10253 4/20 0.46
BCHE P06276 1/20 0.46
ACHE P22303 1/20 0.46
CA12 O43570 4/20 0.46
CA9 Q16790 4/20 0.46
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
KEAP1 Q14145 1/20 0.45
NFE2L2 Q16236 1/20 0.45
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
CYP1A2 P05177 2/20 0.43
CYP3A4 P08684 2/20 0.43
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2962485 1.00 VDR (0.49) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL2955938 1.00 VDR (0.49) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL64190 1.00 VDR (0.49) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL2964106 1.00 VDR (0.49) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL2966008 0.92 GAA (0.52) VDRHTTSMN1; SMN2GAACA12
SCHEMBL3137415 0.92 KMT2A (0.46) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL3136307 0.92 TDP1 (0.51) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL3135353 0.92 TDP1 (0.51) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL1002297 0.92 KMT2A (0.46) VDRHTTSMN1; SMN2GAABCHE
SCHEMBL3135083 0.92 MEN1 (0.44) VDRHTTSMN1; SMN2GAABCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed