SCHEMBL6775188

SCHEMBL6775188

C=Cc1ccc(C(C)C(=O)O)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 13/20 0.64
PTGS1 P23219 8/20 0.52
AKR1C3 P42330 6/20 0.52
AKR1C2 P52895 5/20 0.52
CYP2C9 P11712 4/20 0.52
LMNA P02545 3/20 0.52
CXCR1 P25024 2/20 0.52
CXCR2 P25025 2/20 0.52
SLC22A6 Q4U2R8 2/20 0.52
TSHR P16473 2/20 0.52
ALB P02768 1/20 0.52
ESR1 P03372 1/20 0.52
ALOX5 P09917 1/20 0.52
RARB P10826 1/20 0.52
ADRB3 P13945 1/20 0.52
NFKB1 P19838 1/20 0.52
HTR2A P28223 1/20 0.52
NR1I3 Q14994 1/20 0.52
CXCL8 P10145 1/20 0.52
BLM P54132 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11476903 0.83 PTGS2 (0.58) PTGS2PTGS1AKR1C3AKR1C2SLC22A6
SCHEMBL59197 0.82 PTGS2 (0.74) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL29954993 0.82 TYR (0.59) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL693837 0.82 TYR (0.59) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL11704768 0.82 TYR (0.59) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL11742200 0.81 PTGS2 (0.57) PTGS2PTGS1AKR1C3AKR1C2SLC22A6
SCHEMBL1346361 0.80 PTGS2 (0.55) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL11434457 0.80 PTGS2 (0.55) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL11434458 0.80 PTGS2 (0.55) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL9420395 0.80 PTGS2 (0.55) PTGS2PTGS1AKR1C3AKR1C2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118496417-A Defluorinated resin and preparation method thereof 比亚迪股份有限公司 2024-08-16 CN disclosed
US-20210289794-A1 COMPOSITIONS AND RELATED METHODS FOR AGRICULTURE FLAGSHIP PIONEERING INNOVATIONS V, INC. 2021-09-23 US disclosed
CN-104880908-B Photosensitive resin composition 住友化学株式会社 2019-12-13 CN disclosed
CN-109581811-A Radiation-sensitive resin composition, semiconductor element, display device, cured film and its manufacturing method JSR株式会社 2019-04-05 CN disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
EP-1231205-A4 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR CORP (JP) 2004-05-26 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
WO-2001036370-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR CORPORATION (JP) 2001-05-25 WO disclosed
EP-0473547-A1 Olefinically unsaturated onium salts CIBA-GEIGY AG (CH) 1992-03-04 EP disclosed