Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28517757 | 0.87 | NPC1 (0.30) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL28977021 | 0.78 | CNR2 (0.36) | — | |
| SCHEMBL5969015 | 0.78 | — | — | |
| SCHEMBL2825666 | 0.75 | — | — | |
| SCHEMBL24071 | 0.75 | NPC1 (0.34) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL23495993 | 0.73 | ALDH1A1 (0.30) | SMN1; SMN2POLB | |
| SCHEMBL2498899 | 0.73 | NPC1 (0.31) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL207429 | 0.73 | CA2 (0.38) | GABRA1GABRB2 | |
| SCHEMBL178139 | 0.72 | RIPK1 (0.30) | — | |
| SCHEMBL29213578 | 0.70 | CA2 (0.36) | GABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114746508-A | Polyamide resin composition | 宇部兴产株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2021111937-A1 | POLYAMIDE RESIN COMPOSITION | 宇部興産株式会社 | 2021-06-10 | — | — | WO | disclosed |
| CN-109021557-B | Flame-retardant polyamide composite material and preparation method thereof | 江苏金发科技新材料有限公司 | 2020-08-21 | — | — | CN | disclosed |
| CN-105838226-A | Composition with which cured product having self-healing property is obtained and self-healing coat film having cured coating layer thereof | 株式会社田村制作所 | 2016-08-10 | — | — | CN | disclosed |
| CN-104093748-B | photocurable composition and hard coating agent | ADEKA CORP. (JP) | 2016-02-10 | — | — | CN | disclosed |
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| CN-105209576-A | Flame-retardant composition and flame-retardant synthetic resin composition | ADEKA CORP | 2015-12-30 | — | — | CN | disclosed |
| CN-105209551-A | Flame-retardant synthetic resin composition | ADEKA CORP | 2015-12-30 | — | — | CN | disclosed |
| CN-105102511-A | Resin additive masterbatch and polyolefin resin composition containing the same | ADEKA CORP | 2015-11-25 | — | — | CN | disclosed |
| CN-103429600-B | Novel cpd, near infrared ray absorption and the compound resin composition containing it | ADEKA CORP. (JP) | 2015-11-25 | — | — | CN | disclosed |
| US-6743565-B2 | POLYSTYRENE OXY DERIVATIVES THAT DECOMPOSE UNDER AN ACID TO INCREASE THE SOLUBILITY IN AN ALKALI DEVELOPER AND AN ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20040033437-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-02-19 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |