Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 1/20 | 0.56 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.42 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.41 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.41 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.41 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.41 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.41 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | DPP4 | P27487 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7467574 | 0.78 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL677940 | 0.77 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL138375 | 0.77 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL455611 | 0.77 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| Rimantadine SCHEMBL20409367 | 0.72 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL6655788 | 0.72 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| Rimantadine SCHEMBL2981 | 0.72 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL28416429 | 0.72 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL182779 | 0.72 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL7739624 | 0.72 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 262 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118276405-A | Composition for forming resist underlayer film comprising reaction product of acid dianhydride | 日产化学株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-117908332-A | Composition for forming resist underlayer film containing radical scavenger | 日产化学株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-113383036-B | Composition for forming resist underlayer film containing radical scavenger | 日产化学株式会社 | 2024-02-23 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| CN-116806328-A | Film-forming composition having multiple bonds | 日产化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-116783552-A | Resist underlayer film forming composition containing polymer having alicyclic hydrocarbon group | 日产化学株式会社 | 2023-09-19 | — | — | CN | disclosed |
| CN-116745700-A | Composition for forming resist underlayer film comprising reaction product of acid dianhydride | 日产化学株式会社 | 2023-09-12 | — | — | CN | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100248136-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-7803511-B2 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJIFILM CORPORATION (JP) | 2010-09-28 | — | — | US | disclosed |
| US-20100190106-A1 | RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| WO-2010061977-A2 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | WO | disclosed |
| EP-2157477-A1 | RESIST COMPOSITION FOR NEGATIVE WORKING-TYPE DEVELOPMENT, AND METHOD FOR PATTERN FORMATION USING THE RESIST COMPOSITION | Fujifilm Corporation (JP) | 2010-02-24 | — | — | EP | disclosed |
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | RER1, NOC2L, RAD51 | SLC22A2 4196/4885SLC47A1 3942/4885MAPT 1672/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.