SCHEMBL678579

SCHEMBL678579

c1ccc(Cc2ccccc2/N=N/c2ccccc2Cc2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.50
HTR2A P28223 1/20 0.48
BCL2 P10415 1/20 0.46
BCL2L1 Q07817 1/20 0.46
ALOX5 P09917 1/20 0.41
HPGD P15428 3/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
KEAP1 Q14145 1/20 0.39
ALOX15 P16050 2/20 0.39
HSD17B10 Q99714 2/20 0.39
ALDH1A1 P00352 1/20 0.39
ALOX12 P18054 1/20 0.39
CASP1 P29466 1/20 0.39
CYP3A4 P08684 2/20 0.38
HIF1A Q16665 1/20 0.38
DRD2 P14416 1/20 0.38
DRD1 P21728 1/20 0.38
DRD4 P21917 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30539482 0.92 ALDH1A1 (0.48) CALM1HTR2ABCL2BCL2L1SMN1; SMN2
SCHEMBL29100459 0.92 ALDH1A1 (0.48) CALM1HTR2ABCL2BCL2L1SMN1; SMN2
SCHEMBL29100452 0.82 TP53 (0.45) CALM1HTR2ABCL2BCL2L1SMN1; SMN2
SCHEMBL30539479 0.82 TP53 (0.45) CALM1HTR2ABCL2BCL2L1SMN1; SMN2
SCHEMBL14256883 0.82 CALM1 (0.46) CALM1HTR2ABCL2BCL2L1ALOX5
SCHEMBL30612328 0.82 CALM1 (0.46) CALM1HTR2ABCL2BCL2L1ALOX5
SCHEMBL439991 0.80 CALM1 (0.44) CALM1HTR2ABCL2BCL2L1ALOX5
SCHEMBL972711 0.79 CALM1 (0.69) CALM1HTR2ABCL2BCL2L1ALOX5
SCHEMBL6605569 0.77 ALDH1A1 (0.44) CALM1HTR2ABCL2BCL2L1ALOX5
SCHEMBL10456439 0.77 HTR2A (0.41) CALM1HTR2ABCL2BCL2L1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-54056085-A None JP disclosed
US-9527972-B2 Release film formed from polylactic acid-containing resin 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-12-27 US disclosed
US-20150329685-A1 RELEASE FILM FORMED FROM POLYLACTIC ACID-CONTAINING RESIN 3M INNOVATIVE PROPERTIES COMPANY 2015-11-19 US disclosed
EP-2391678-B1 POLYLACTIC ACID-CONTAINING RESIN COMPOSITIONS AND FILMS 3M INNOVATIVE PROPERTIES CO (US) 2015-11-04 EP disclosed
US-9090771-B2 Release film formed from polylactic acid-containing resin 3M INNOVATIVE PROPERTIES COMPANY (US) 2015-07-28 US disclosed
US-8258243-B2 Grafted silicone polymer and products made therewith 3M INNOVATIVE PROPERTIES COMPANY (US) 2012-09-04 US disclosed
EP-1983017-B1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND SHOWA DENKO KK (JP) 2012-04-18 EP disclosed
EP-2391678-A1 POLYLACTIC ACID-CONTAINING RESIN COMPOSITIONS AND FILMS 3M Innovative Properties Company (US) 2011-12-07 EP disclosed
US-20110287206-A1 Polylactic Acid-Containing Resin Composition, Polylactic Acid-Containing Resin Film and Methods Thereof 3M INNOVATIVE PROPERTIES COMPANY (US) 2011-11-24 US disclosed
US-7888399-B2 Curable composition containing thiol compound SHOWA DENKO K.K. (JP) 2011-02-15 US disclosed
WO-2008134428-A1 GRAFTED SILICONE POLYMER AND PRODUCTS MADE THEREWITH 3M INNOVATIVE PROPERTIES COMPANY (US) 2008-11-06 WO disclosed
EP-1983017-A1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND Showa Denko K.K. (JP) 2008-10-22 EP disclosed
US-6562513-B1 Thermopolymerizable composition for battery use SHOWA DENKI KABUSHIKI KAISHA (JP) 2003-05-13 US disclosed
US-20020161146-A1 A (meth)acrylate compound, solid electrolytes and battery SHOWA DENKO K.K. 2002-10-31 US disclosed
US-6316563-B2 FOR OBTAINING A HIGHLY ION-CONDUCTIVE SOLID POLYMER ELECTROLYTE WHICH IS USED IN BATTERY OR ELECTRIC DOUBLE LAYER CAPACITORS SHOWA DENKO K.K. (JP) 2001-11-13 US disclosed
US-20010011119-A1 Battery; stability, electroconductivity SHOWA DENKO K.K. (JP) 2001-08-02 US disclosed
EP-0239385-B1 RADIATION-SENSITIVE POSITIVE RESIST AND COMPOSITION CONTAINING THE SAME TORAY INDUSTRIES, INC. (JP) 1993-05-26 EP disclosed
US-4800151-A 2,2,2-TRIFLUOROETHYL A-CHLOROACRYLATE-2,2,3,3-TETRAFLUOROPROPYL A-CHLOROACRYLATE COPOLYMER TORAY INDUSTRIES, INC. (JP) 1989-01-24 US disclosed
EP-0239385-A2 Radiation-sensitive positive resist and composition containing the same TORAY INDUSTRIES, INC. (JP) 1987-09-30 EP disclosed
JP-S5456085-A LIQUID CRYSTAL COMPOSITION NEC CORP 1979-05-04 JP disclosed